SCHEMBL13683081

SCHEMBL13683081

CCC(C)c1ccc(OC(=O)c2ccc(C)cc2)c(O)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.46
ESR2 Q92731 1/20 0.46
ALDH1A1 P00352 3/20 0.42
GAA P10253 2/20 0.42
USP2 O75604 1/20 0.42
PKM P14618 1/20 0.42
HPGD P15428 1/20 0.42
ALOX15 P16050 1/20 0.42
HSD17B10 Q99714 1/20 0.42
KMT2A Q03164 3/20 0.41
MEN1 O00255 1/20 0.41
NPC1 O15118 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41
RAB9A P51151 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
HDAC4 P56524 1/20 0.40
HDAC2 Q92769 1/20 0.40
HDAC8 Q9BY41 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683062 0.88 HDAC4 (0.44) ESR1ESR2ALDH1A1GAAUSP2
SCHEMBL13683078 0.83 ADRB2 (0.42) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL11922869 0.80 ALDH1A1 (0.49) ALDH1A1GAAUSP2PKMHPGD
Hydrochloric Acid SCHEMBL11289529 0.79 ADRB2 (0.56) ALDH1A1GAAHPGDALOX15HSD17B10
SCHEMBL13683083 0.79 ALDH1A1 (0.46) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL11558986 0.78 TDP1 (0.49) ESR1ESR2ALDH1A1GAAHSD17B10
SCHEMBL13683072 0.78 ESR1 (0.49) ESR1ESR2ALDH1A1GAAUSP2
Alcohol SCHEMBL11558977 0.77 ESR1 (0.40) ESR1ESR2ALDH1A1GAAHPGD
SCHEMBL11282290 0.76 PMP22 (0.52) ESR1ESR2KMT2AMEN1CYP1A2
SCHEMBL10182474 0.75 ALDH1A1 (0.43) ALDH1A1GAAUSP2PKMHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
EP-1975713-A2 Positive resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-10-01 EP disclosed