SCHEMBL13683062

SCHEMBL13683062

CCC(C)c1ccc(OC(=O)c2ccccc2)c(O)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC4 P56524 1/20 0.44
HDAC2 Q92769 1/20 0.44
HDAC8 Q9BY41 1/20 0.44
GAA P10253 3/20 0.44
ALDH1A1 P00352 3/20 0.44
KMT2A Q03164 3/20 0.43
USP2 O75604 2/20 0.43
ALOX15 P16050 2/20 0.43
HSD17B10 Q99714 2/20 0.43
ESR1 P03372 2/20 0.43
ESR2 Q92731 2/20 0.43
MEN1 O00255 2/20 0.43
MAPT P10636 2/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
JAK2 O60674 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
PKM P14618 1/20 0.43
HPGD P15428 1/20 0.43
CYP3A4 P08684 1/20 0.42
TDP1 Q9NUW8 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683081 0.88 ESR1 (0.46) HDAC4HDAC2HDAC8GAAALDH1A1
SCHEMBL13683078 0.86 ADRB2 (0.42) HDAC4HDAC2HDAC8GAAALDH1A1
SCHEMBL11922869 0.81 ALDH1A1 (0.49) HDAC4HDAC2HDAC8GAAALDH1A1
SCHEMBL13683077 0.80 KMT2A (0.59) HDAC4HDAC2HDAC8GAAALDH1A1
SCHEMBL6721979 0.79 ALDH1A1 (0.56) ALDH1A1KMT2AESR1MEN1MAPT
SCHEMBL12133492 0.78 KMT2A (0.49) HDAC4HDAC2HDAC8ALDH1A1KMT2A
SCHEMBL13683083 0.77 ALDH1A1 (0.46) HDAC4HDAC2HDAC8GAAALDH1A1
SCHEMBL13683079 0.77 ADRB2 (0.43) HDAC4HDAC2HDAC8GAAALDH1A1
SCHEMBL2886488 0.77 ALDH1A1 (0.53) GAAALDH1A1KMT2AUSP2ALOX15
SCHEMBL13683072 0.76 ESR1 (0.49) GAAALDH1A1KMT2AUSP2ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed