SCHEMBL13683072

SCHEMBL13683072

CCC(C)c1ccc(O)c(OC(=O)c2ccc(OC)cc2)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.49
ESR2 Q92731 1/20 0.49
KMT2A Q03164 3/20 0.48
GAA P10253 3/20 0.47
TP53 P04637 1/20 0.47
THRB P10828 1/20 0.47
BCHE P06276 1/20 0.46
TYR P14679 1/20 0.46
ACHE P22303 1/20 0.46
ALDH1A1 P00352 6/20 0.44
USP2 O75604 1/20 0.44
PKM P14618 1/20 0.44
HPGD P15428 1/20 0.44
ALOX15 P16050 1/20 0.44
HSD17B10 Q99714 1/20 0.44
MAPT P10636 1/20 0.44
HSD17B2 P37059 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683083 0.86 ALDH1A1 (0.46) KMT2AGAATP53ALDH1A1USP2
SCHEMBL13683079 0.82 ADRB2 (0.43) KMT2AGAAALDH1A1USP2PKM
SCHEMBL12637605 0.80 KMT2A (0.54) KMT2AGAAALDH1A1MAPTL3MBTL1
SCHEMBL13683081 0.78 ESR1 (0.46) ESR1ESR2KMT2AGAAALDH1A1
SCHEMBL9908607 0.78 GAA (0.54) KMT2AGAATP53ALDH1A1USP2
SCHEMBL178482 0.77 TSHR (0.62) GAABCHETYRACHEALDH1A1
SCHEMBL13683062 0.76 HDAC4 (0.44) ESR1ESR2KMT2AGAAALDH1A1
SCHEMBL13920805 0.74 ALDH1A1 (0.50) KMT2AGAATP53ALDH1A1USP2
SCHEMBL13683089 0.74 ALDH1A1 (0.51) KMT2AGAATP53THRBALDH1A1
SCHEMBL13683078 0.74 ADRB2 (0.42) KMT2AGAAALDH1A1USP2PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed