SCHEMBL13683078

SCHEMBL13683078

CCC(C)c1ccc(OC(=O)c2ccc3ccccc3c2)c(O)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.42
ADRB1 P08588 1/20 0.42
ADRB3 P13945 1/20 0.42
UTS2R Q9UKP6 1/20 0.41
HRH3 Q9Y5N1 2/20 0.40
HDAC4 P56524 1/20 0.40
HDAC2 Q92769 1/20 0.40
HDAC8 Q9BY41 1/20 0.40
DRD3 P35462 1/20 0.39
POLB P06746 1/20 0.39
PTGS1 P23219 1/20 0.39
PTGS2 P35354 1/20 0.39
ALDH1A1 P00352 2/20 0.39
USP2 O75604 1/20 0.39
GAA P10253 1/20 0.39
PKM P14618 1/20 0.39
HPGD P15428 1/20 0.39
ALOX15 P16050 1/20 0.39
HSD17B10 Q99714 1/20 0.39
MEN1 O00255 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683079 0.92 ADRB2 (0.43) ADRB2ADRB1ADRB3UTS2RHDAC4
SCHEMBL13683089 0.88 ALDH1A1 (0.51) POLBALDH1A1GAAMEN1MAPT
SCHEMBL13683062 0.86 HDAC4 (0.44) HDAC4HDAC2HDAC8ALDH1A1USP2
SCHEMBL13683088 0.84 ADRB2 (0.41) ADRB2ADRB1ADRB3UTS2RHRH3
SCHEMBL10053089 0.84 MEN1 (0.50) ADRB2ADRB1ADRB3UTS2RALDH1A1
SCHEMBL13683081 0.83 ESR1 (0.46) HDAC4HDAC2HDAC8ALDH1A1USP2
SCHEMBL13683251 0.82 HDAC1 (0.40) ADRB2ADRB1ADRB3UTS2RHRH3
SCHEMBL14665363 0.80 ALDH1A1 (0.46) ADRB2ADRB1ADRB3UTS2RALDH1A1
SCHEMBL13683077 0.80 KMT2A (0.59) ADRB2ADRB1ADRB3UTS2RHDAC4
SCHEMBL11922869 0.76 ALDH1A1 (0.49) HDAC4HDAC2HDAC8ALDH1A1USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
EP-1975713-A2 Positive resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-10-01 EP disclosed