SCHEMBL13683083

SCHEMBL13683083

CCC(C)c1ccc(O)c(OC(=O)c2ccc(Cl)cc2)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.46
GAA P10253 4/20 0.46
USP2 O75604 1/20 0.46
PKM P14618 1/20 0.46
HPGD P15428 1/20 0.46
ALOX15 P16050 1/20 0.46
HSD17B10 Q99714 1/20 0.46
KMT2A Q03164 5/20 0.42
MAPT P10636 2/20 0.42
CYP2C9 P11712 3/20 0.40
CYP2C19 P33261 3/20 0.40
MEN1 O00255 3/20 0.40
LMNA P02545 3/20 0.40
MAPK1 P28482 2/20 0.40
TP53 P04637 2/20 0.40
HDAC4 P56524 1/20 0.40
HDAC2 Q92769 1/20 0.40
HDAC8 Q9BY41 1/20 0.40
CYP1A2 P05177 2/20 0.40
CYP3A4 P08684 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683072 0.86 ESR1 (0.49) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL13683079 0.81 ADRB2 (0.43) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL13683081 0.79 ESR1 (0.46) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL9908607 0.79 GAA (0.54) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL13683062 0.77 HDAC4 (0.44) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL13920805 0.75 ALDH1A1 (0.50) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL9906971 0.74 MAPK1 (0.50) ALDH1A1USP2HPGDKMT2AMAPT
SCHEMBL13683087 0.73 GAA (0.60) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL13683078 0.73 ADRB2 (0.42) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL178482 0.72 TSHR (0.62) ALDH1A1GAAUSP2PKMHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed