SCHEMBL13683088

SCHEMBL13683088

CCC(C)c1ccc(C(C)(C)C)c(OC(=O)c2ccc3ccccc3c2)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.41
ADRB1 P08588 1/20 0.41
ADRB3 P13945 1/20 0.41
UTS2R Q9UKP6 1/20 0.40
GABBR2 O75899 1/20 0.38
GABBR1 Q9UBS5 1/20 0.38
POLB P06746 1/20 0.38
NPC1 O15118 3/20 0.37
RAB9A P51151 3/20 0.37
MEN1 O00255 1/20 0.37
MAPT P10636 1/20 0.37
KMT2A Q03164 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
TSHR P16473 1/20 0.37
ALDH1A1 P00352 2/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
KDM4E B2RXH2 1/20 0.37
GAA P10253 1/20 0.37
RXRA P19793 1/20 0.37
RXRB P28702 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683079 0.85 ADRB2 (0.43) ADRB2ADRB1ADRB3UTS2RPOLB
SCHEMBL13683089 0.84 ALDH1A1 (0.51) GABBR2GABBR1POLBNPC1RAB9A
SCHEMBL13683078 0.84 ADRB2 (0.42) ADRB2ADRB1ADRB3UTS2RPOLB
SCHEMBL10053089 0.82 MEN1 (0.50) ADRB2ADRB1ADRB3UTS2RGABBR2
SCHEMBL13683251 0.80 HDAC1 (0.40) ADRB2ADRB1ADRB3UTS2RPOLB
SCHEMBL14665363 0.78 ALDH1A1 (0.46) ADRB2ADRB1ADRB3UTS2RGABBR2
SCHEMBL14119106 0.75 AKR1C3 (0.42) ADRB2ADRB1ADRB3TSHRALDH1A1
SCHEMBL13144209 0.73 KMT2A (0.56) POLBNPC1MEN1MAPTKMT2A
SCHEMBL26194800 0.73 ALDH1A1 (0.40) ADRB2ADRB1ADRB3NPC1RAB9A
SCHEMBL20548705 0.72 RARA (0.50) GABBR2GABBR1NPC1RAB9AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed