SCHEMBL13683089

SCHEMBL13683089

CCC(C)c1ccc(OC(=O)c2ccc3ccccc3c2)c(OC)c1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.51
MAPT P10636 2/20 0.49
TSHR P16473 1/20 0.48
KMT2A Q03164 2/20 0.48
AKR1C3 P42330 1/20 0.45
NPC1 O15118 1/20 0.44
NQO2 P16083 1/20 0.44
CASP3 P42574 1/20 0.44
RAB9A P51151 1/20 0.44
SENP7 Q9BQF6 1/20 0.44
THRB P10828 2/20 0.44
TP53 P04637 1/20 0.44
GAA P10253 1/20 0.44
MEN1 O00255 1/20 0.44
CYP3A4 P08684 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
POLB P06746 1/20 0.43
ABCB1 P08183 1/20 0.43
ABCG2 Q9UNQ0 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683078 0.88 ADRB2 (0.42) ALDH1A1MAPTKMT2ANPC1RAB9A
SCHEMBL13683079 0.87 ADRB2 (0.43) ALDH1A1MAPTKMT2ANPC1RAB9A
SCHEMBL13683088 0.84 ADRB2 (0.41) ALDH1A1MAPTTSHRKMT2ANPC1
SCHEMBL10053089 0.84 MEN1 (0.50) ALDH1A1MAPTTSHRKMT2ANPC1
SCHEMBL13683251 0.82 HDAC1 (0.40) MAPTKMT2ANPC1RAB9ATHRB
SCHEMBL14665363 0.80 ALDH1A1 (0.46) ALDH1A1MAPTTSHRKMT2ANPC1
SCHEMBL14981331 0.77 KMT2A (0.61) ALDH1A1MAPTKMT2AAKR1C3NPC1
SCHEMBL10148400 0.76 TSHR (0.54) ALDH1A1MAPTTSHRNPC1RAB9A
SCHEMBL15294615 0.76 LMNA (0.53) ALDH1A1MAPTTP53
SCHEMBL13144215 0.76 SLC6A3 (0.46) ALDH1A1MAPTTSHRKMT2ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed