SCHEMBL13683079

SCHEMBL13683079

CCC(C)c1ccc(O)c(OC(=O)c2ccc3ccccc3c2)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.43
ADRB1 P08588 1/20 0.43
ADRB3 P13945 1/20 0.43
ALDH1A1 P00352 3/20 0.43
GAA P10253 2/20 0.43
USP2 O75604 1/20 0.43
PKM P14618 1/20 0.43
HPGD P15428 1/20 0.43
ALOX15 P16050 1/20 0.43
HSD17B10 Q99714 1/20 0.43
UTS2R Q9UKP6 1/20 0.42
HDAC4 P56524 1/20 0.41
HDAC2 Q92769 1/20 0.41
HDAC8 Q9BY41 1/20 0.41
POLB P06746 1/20 0.40
PTGS1 P23219 1/20 0.40
PTGS2 P35354 1/20 0.40
MEN1 O00255 1/20 0.40
MAPT P10636 1/20 0.40
KMT2A Q03164 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683078 0.92 ADRB2 (0.42) ADRB2ADRB1ADRB3ALDH1A1GAA
SCHEMBL13683089 0.87 ALDH1A1 (0.51) ALDH1A1GAAPOLBMEN1MAPT
SCHEMBL13683088 0.85 ADRB2 (0.41) ADRB2ADRB1ADRB3ALDH1A1GAA
SCHEMBL10053089 0.85 MEN1 (0.50) ADRB2ADRB1ADRB3ALDH1A1GAA
SCHEMBL13683251 0.83 HDAC1 (0.40) ADRB2ADRB1ADRB3UTS2RHDAC2
SCHEMBL13683072 0.82 ESR1 (0.49) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL14665363 0.81 ALDH1A1 (0.46) ADRB2ADRB1ADRB3ALDH1A1HPGD
SCHEMBL13683083 0.81 ALDH1A1 (0.46) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL13683087 0.80 GAA (0.60) ADRB2ADRB1ADRB3ALDH1A1GAA
SCHEMBL13898636 0.78 ALDH1A1 (0.45) ALDH1A1GAAUSP2PKMHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed