SCHEMBL13411744

SCHEMBL13411744

O=C(Nc1nnn[nH]1)c1nc[nH]c1C(=O)Nc1nnn[nH]1

nearest known ligand 0.51

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 3/20 0.51
▸ ALDH1A1 P00352 7/20 0.47
▸ GAA P10253 5/20 0.47
▸ KMT2A Q03164 4/20 0.47
▸ MEN1 O00255 3/20 0.47
▸ SMN1; SMN2 Q16637 3/20 0.47
▸ L3MBTL1 Q9Y468 2/20 0.47
▸ KDM4E B2RXH2 2/20 0.47
▸ HPGD P15428 2/20 0.46
▸ CYP1A2 P05177 1/20 0.46
▸ TDP1 Q9NUW8 1/20 0.45
▸ POLB P06746 1/20 0.43
▸ HSD17B10 Q99714 1/20 0.43
▸ LMNA P02545 1/20 0.42
▸ MAPK1 P28482 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13715689 0.75 KDM4E (0.49) MAPTALDH1A1KMT2AL3MBTL1KDM4E
SCHEMBL10593982 0.74 TDP1 (0.33) MAPTALDH1A1GAAKMT2AMEN1
SCHEMBL10776251 0.74 KDM4E (0.38) MAPTALDH1A1KMT2AL3MBTL1KDM4E
SCHEMBL13876946 0.72 ALPL (0.40) MAPTGAAKMT2AMEN1SMN1; SMN2
SCHEMBL12892192 0.72 KDM4E (0.46) GAAKMT2ASMN1; SMN2L3MBTL1KDM4E
SCHEMBL13715630 0.71 MEN1 (0.31) GAAKMT2AMEN1L3MBTL1TDP1
SCHEMBL1830518 0.71 CASP3 (0.44) MAPTALDH1A1KMT2AMEN1SMN1; SMN2
SCHEMBL10937760 0.71 KIT (0.45) MAPTALDH1A1KMT2ASMN1; SMN2L3MBTL1
SCHEMBL10933803 0.71 GRM1 (0.42) ALDH1A1GAAKMT2AMEN1SMN1; SMN2
SCHEMBL13715917 0.70 CA1 (0.55) MAPTALDH1A1GAAKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100075500-A1 Metal polishing slurry and chemical mechanical polishing method FUJIFILM CORPORATION (JP) 2010-03-25 — — US disclosed
US-20100075500-A1 Metal polishing slurry and chemical mechanical polishing method FUJIFILM CORPORATION (JP) 2010-03-25 — — US disclosed
US-20090088361-A1 CLEANING AGENT FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 — — US disclosed
US-20090088361-A1 CLEANING AGENT FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090088361-A1 CLEANING AGENT FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD USING THE SAME AOC1, SPIN1, USP1 MAPT 4789/4885ALDH1A1 1701/4885GAA 2990/4885
US-20100075500-A1 Metal polishing slurry and chemical mechanical polishing method NOX1, NOXO1, PIEZO1 MAPT 3646/4885ALDH1A1 2991/4885GAA 2788/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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