SCHEMBL1398396

SCHEMBL1398396

Cc1cc(/C=C/C(=O)OCCOCCOCCOC(=O)/C=C/c2cc(C)c(O)c(C(C)(C)C)c2)cc(C(C)(C)C)c1O

nearest known ligand 0.48

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
GABBR2 O75899 1/20 0.48
GABBR1 Q9UBS5 1/20 0.48
MET P08581 6/20 0.47
ALOX5 P09917 7/20 0.46
CYP3A4 P08684 2/20 0.44
CYP1A2 P05177 1/20 0.44
CYP2D6 P10635 1/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2B6 P20813 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1398397 1.00 GABBR2 (0.48) GABBR2GABBR1METALOX5CYP3A4
SCHEMBL30648252 1.00 GABBR2 (0.48) GABBR2GABBR1METALOX5CYP3A4
SCHEMBL14483626 0.92 GABBR2 (0.56) GABBR2GABBR1METALOX5CYP3A4
SCHEMBL2803205 0.90 APP (0.49) GABBR2GABBR1METALOX5CYP3A4
SCHEMBL11306366 0.88 CYP3A4 (0.57) GABBR2GABBR1METALOX5CYP3A4
Triethylene Glycol SCHEMBL1398398 0.82 GABBR2 (0.49) GABBR2GABBR1CYP3A4CYP1A2CYP2D6
SCHEMBL6734358 0.82 GABBR2 (0.57) GABBR2GABBR1METALOX5CYP3A4
SCHEMBL7754711 0.81 GABBR2 (0.56) GABBR2GABBR1METALOX5CYP3A4
SCHEMBL11858893 0.81 ALOX5 (0.64) GABBR2GABBR1METALOX5CYP3A4
SCHEMBL14482404 0.81 GABBR2 (0.56) GABBR2GABBR1METALOX5CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260103482-A1 STABILIZER, ORGANIC MATERIAL COMPOSITION, AND METHOD FOR STABILIZING ORGANIC MATERIAL SUMITOMO CHEMICAL CO (JP) 2026-04-16 US disclosed
EP-4600327-A1 STABILIZER, ORGANIC MATERIAL COMPOSITION, AND ORGANIC MATERIAL STABILIZING METHOD Sumitomo Chemical Company, Limited (JP) 2025-08-13 EP disclosed
WO-2024150714-A1 PROCESSING STABILIZER, RESIN COMPOSITION, AND ORGANIC MATERIAL STABILIZING METHOD 住友化学株式会社 2024-07-18 WO disclosed
WO-2024090435-A1 PHENOLIC COMPOUND, STABILIZER, ORGANIC MATERIAL COMPOSITION, METHOD FOR STABILIZING ORGANIC MATERIAL, AND METHOD FOR PRODUCING PHENOLIC COMPOUND 住友化学株式会社 2024-05-02 WO disclosed
WO-2024075651-A1 STABILIZER, ORGANIC MATERIAL COMPOSITION, AND ORGANIC MATERIAL STABILIZING METHOD 住友化学株式会社 2024-04-11 WO disclosed
WO-2023166978-A1 PROCESS STABILIZER, ORGANIC MATERIAL COMPOSITION, AND METHOD FOR STABILIZING ORGANIC MATERIAL 住友化学株式会社 2023-09-07 WO disclosed
WO-2023286616-A1 PHENOLIC COMPOUND, ORGANIC MATERIAL STABILIZER, RESIN COMPOSITION, AND METHOD FOR STABILIZING ORGANIC MATERIAL 住友化学株式会社 2023-01-19 WO disclosed
WO-2022210295-A1 PHOSPHOROUS ESTER COMPOUND, METHOD FOR PRODUCING SAME, AND USE APPLICATION FOR SAME 住友化学株式会社 2022-10-06 WO disclosed
EP-3257858-B1 PHOSPHOROUS ACID COMPOUND, METHOD FOR PRODUCING SAID COMPOUND, AND USE OF SAID COMPOUND SUMITOMO CHEMICAL CO (JP) 2020-08-26 EP disclosed
US-10150857-B2 Phosphorous acid compound, method for producing said compound, and use of said compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-12-11 US disclosed
EP-2065359-B1 Bisphenol Monoester Compound SUMITOMO CHEMICAL CO (JP) 2011-03-02 EP disclosed
US-7741393-B2 Organic silicon-based compound and method of producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-06-22 US disclosed
US-20090143517-A1 Bisphenol Monoester compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-06-04 US disclosed
EP-2065359-A1 Bisphenol Monoester Compound Sumitomo Chemical Company, Limited (JP) 2009-06-03 EP disclosed
US-20070203275-A1 Organic Silicon-Based Compound And Method Of Producing The Same SUMITOMO CHEMICAL COMPANY, LIMITED 2007-08-30 US disclosed
US-20050247913-A1 Phosphorous ester compound, process for producing the same, and use thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-11-10 US disclosed
US-6075159-A USE AS A STABILIZER FOR AN ORGANIC MATERIAL SUCH AS THERMOPLASTIC RESINS, THERMOSETTING RESINS, NATURAL OR SYNTHETIC RUBBERS, MINERAL OILS, LUBRICATING OILS, ADHESIVES AND PAINTS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-06-13 US disclosed
US-6046261-A STABILIZER FOR ORGANIC MATERIAL HAVING EXCELLENT BLOOMING RESISTANCE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-04-04 US disclosed
US-5889095-A OXYGEN AND HEAT RESISTANCE SUMITOMO CHEMICAL COMPANY, LTD. (JP) 1999-03-30 US disclosed
US-5874494-A DETERIORATION STABILIZER FOR THERMOPLASTIC RESIN; OXIDATION RESISTANCE, DISCOLORATION INHIBITION, HEAT RESISTANCE, CROSSLINKING INHIBITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090143517-A1 Bisphenol Monoester compound CYP19A1, ESR1, ESRRA GABBR2 2283/4885GABBR1 2408/4885MET 483/4885
US-20070203275-A1 Organic Silicon-Based Compound And Method Of Producing The Same ARSA, OR10J3, HDAC10 GABBR2 3146/4885GABBR1 2885/4885MET 4478/4885
US-10150857-B2 Phosphorous acid compound, method for producing said compound, and use of said compound ACSL6, ACSL3, ADSL GABBR2 4281/4885GABBR1 4531/4885MET 3174/4885
US-20260103482-A1 STABILIZER, ORGANIC MATERIAL COMPOSITION, AND METHOD FOR STABILIZING ORGANIC MATERIAL HNRNPL, APOL1, OR10J3 GABBR2 4592/4885GABBR1 4670/4885MET 1842/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.