SCHEMBL14099863

SCHEMBL14099863

CN(C)c1ccc(C(=CCC=C(c2ccccc2)c2ccc(N(C)C)cc2)c2ccccc2)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 6/20 0.58
KMT2A Q03164 5/20 0.58
HPGD P15428 4/20 0.58
NPC1 O15118 3/20 0.58
MEN1 O00255 2/20 0.58
ALDH1A1 P00352 8/20 0.55
GFER P55789 1/20 0.55
MAPT P10636 7/20 0.47
SMN1; SMN2 Q16637 3/20 0.47
CASP3 P42574 1/20 0.47
CYP1B1 Q16678 1/20 0.47
SENP8 Q96LD8 1/20 0.47
SENP7 Q9BQF6 1/20 0.47
SENP6 Q9GZR1 1/20 0.47
RELA Q04206 1/20 0.47
MAPK1 P28482 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
LMNA P02545 2/20 0.45
KCNK3 O14649 1/20 0.45
KDM4E B2RXH2 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4897408 0.92 ALDH1A1 (0.52) RAB9AKMT2AHPGDNPC1MEN1
Dibenzoylmethane SCHEMBL9838231 0.89 RAB9A (0.56) RAB9AKMT2AHPGDNPC1MEN1
Benzenesulfonamide SCHEMBL9750114 0.85 CA2 (0.49) RAB9AKMT2AHPGDNPC1MEN1
SCHEMBL8153005 0.84 RAB9A (0.62) RAB9AKMT2AHPGDNPC1MEN1
SCHEMBL8153001 0.84 RAB9A (0.62) RAB9AKMT2AHPGDNPC1MEN1
SCHEMBL8184701 0.84 RAB9A (0.62) RAB9AKMT2AHPGDNPC1MEN1
Benzenesulfonamide SCHEMBL9749590 0.83 CA2 (0.50) RAB9AKMT2AHPGDNPC1MEN1
SCHEMBL27794822 0.82 KMT2A (0.66) RAB9AKMT2AHPGDNPC1MEN1
SCHEMBL9750091 0.80 ALDH1A1 (0.50) RAB9AKMT2AHPGDNPC1MEN1
SCHEMBL8140201 0.78 RAB9A (0.59) RAB9AKMT2AHPGDNPC1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1630606-B1 POSITIVE PHOTOSENSITIVE COMPOSITION THINK LABS KK (JP) 2008-08-13 EP disclosed
EP-1750175-B1 POSITIVE PHOTOSENSITIVE COMPOSITION THINK LABS KK (JP) 2008-07-30 EP disclosed
US-20070292802-A1 Positive Photosenstive Composition THINK LABORATIORY CO., LTD. (JP) 2007-12-20 US disclosed
US-20070292802-A1 Positive Photosenstive Composition THINK LABORATIORY CO., LTD. (JP) 2007-12-20 US disclosed
US-20070259295-A1 Positive Photosensitive Composition THINK LABORATORY CO., LTD. (JP) 2007-11-08 US disclosed
US-20070259295-A1 Positive Photosensitive Composition THINK LABORATORY CO., LTD. (JP) 2007-11-08 US disclosed
US-20070212640-A1 Positive Photosensitive Composition THINK LABORATORY CO., LTD. (JP) 2007-09-13 US disclosed
US-20070154835-A1 Positive photosensitive composition THINK LABORATORY CO., LTD. (JP) 2007-07-05 US disclosed
EP-1775632-A1 POSITIVE-WORKING PHOTOSENSITIVE COMPOSITION THINK LABORATORY CO., LTD. (JP) 2007-04-18 EP disclosed
EP-1750175-A1 POSITIVE PHOTOSENSITIVE COMPOSITION THINK LABORATORY CO., LTD. (JP) 2007-02-07 EP disclosed