SCHEMBL14130179

SCHEMBL14130179

Cc1ccccc1/N=N/c1ccc(OC(=O)c2cc(C(=O)Oc3ccc(/N=N/c4ccccc4C)cc3C)cc(C(=O)Oc3ccc(/N=N/c4ccccc4C)cc3C)c2)c(C)c1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 3/20 0.51
▸ SMN1; SMN2 Q16637 2/20 0.51
▸ TP53 P04637 1/20 0.51
▸ CYP3A4 P08684 1/20 0.51
▸ TSHR P16473 1/20 0.51
▸ MAPK1 P28482 1/20 0.51
▸ AHR P35869 1/20 0.43
▸ KMT2A Q03164 5/20 0.43
▸ MEN1 O00255 4/20 0.43
▸ SERPINE1 P05121 1/20 0.41
▸ MAPT P10636 5/20 0.40
▸ ALDH1A1 P00352 2/20 0.40
▸ LMNA P02545 1/20 0.40
▸ NPSR1 Q6W5P4 2/20 0.40
▸ GAA P10253 2/20 0.40
▸ L3MBTL1 Q9Y468 2/20 0.40
▸ PPARG P37231 1/20 0.39
▸ PPARD Q03181 1/20 0.39
▸ PPARA Q07869 1/20 0.39
▸ MAOB P27338 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14130411 0.95 SMN1; SMN2 (0.49) TDP1SMN1; SMN2TP53CYP3A4TSHR
SCHEMBL14130412 0.95 TP53 (0.51) TDP1SMN1; SMN2TP53CYP3A4TSHR
SCHEMBL14130426 0.83 THRB (0.46) TDP1SMN1; SMN2TP53CYP3A4TSHR
SCHEMBL26375112 0.81 KMT2A (0.45) TDP1SMN1; SMN2KMT2AMEN1MAPT
SCHEMBL20741593 0.78 TDP1 (0.54) TDP1SMN1; SMN2TP53CYP3A4TSHR
SCHEMBL14130422 0.77 THRB (0.46) TSHRMAPK1KMT2AMEN1MAPT
SCHEMBL25491829 0.76 PRSS1 (0.48) TDP1SMN1; SMN2MAPK1KMT2AMEN1
SCHEMBL14130423 0.75 FTO (0.55) MAPK1KMT2AMEN1MAPTL3MBTL1
SCHEMBL14130187 0.74 SERPINE1 (0.47) SMN1; SMN2TSHRMAPK1KMT2AMEN1
SCHEMBL14130007 0.73 AHR (0.66) TDP1SMN1; SMN2TP53CYP3A4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
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