Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.39 |
| ▸ | MAPT | P10636 | 3/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 3/20 | 0.37 |
| ▸ | ESR1 | P03372 | 2/20 | 0.37 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 3/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 2/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 3/20 | 0.34 |
| ▸ | NPC1 | O15118 | 2/20 | 0.34 |
| ▸ | ITGAV | P06756 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27705172 | 1.00 | PLA2G7 (0.40) | PLA2G7KMT2AMAPTCYP1A2CYP2C9 | |
| SCHEMBL6809982 | 0.89 | POLB (0.38) | KMT2AMAPTCYP1A2MEN1ESR1 | |
| SCHEMBL28493343 | 0.85 | MAPT (0.35) | KMT2AMAPTCYP1A2CYP2C9CYP2C19 | |
| SCHEMBL7790657 | 0.83 | P2RX7 (0.39) | MAPTCYP1A2CYP2C9CYP2C19GAA | |
| SCHEMBL7790655 | 0.83 | P2RX7 (0.39) | MAPTCYP1A2CYP2C9CYP2C19GAA | |
| SCHEMBL5367442 | 0.81 | F2 (0.40) | PLA2G7MAPTCYP1A2CYP2C9CYP2C19 | |
| SCHEMBL6741146 | 0.81 | F2 (0.40) | PLA2G7MAPTCYP1A2CYP2C9CYP2C19 | |
| SCHEMBL29761878 | 0.81 | F2 (0.40) | PLA2G7MAPTCYP1A2CYP2C9CYP2C19 | |
| SCHEMBL92016 | 0.81 | KDM4E (0.49) | PLA2G7KMT2AMAPTMEN1LMNA | |
| SCHEMBL7976575 | 0.81 | KDM4E (0.49) | PLA2G7KMT2AMAPTMEN1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108073042-B | Positive photosensitive resin composition | 株式会社东进世美肯 | 2024-01-23 | — | — | CN | disclosed |
| EP-2299325-A1 | Resist composition, resist pattern forming method and compound | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2011-03-23 | — | — | EP | disclosed |
| US-6835530-B2 | Base material for lithography | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-12-28 | — | — | US | disclosed |
| US-20040121260-A1 | Base material for lithography | TOKYO OHKA KOGYO CO., LTD. | 2004-06-24 | — | — | US | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |