Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | TRIM24 | O15164 | 1/20 | 0.38 |
| ▸ | BRD1 | O95696 | 1/20 | 0.38 |
| ▸ | BRPF1 | P55201 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 4/20 | 0.38 |
| ▸ | CDK5 | Q00535 | 2/20 | 0.38 |
| ▸ | CDK5R1 | Q15078 | 2/20 | 0.38 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 3/20 | 0.38 |
| ▸ | NPC1 | O15118 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | ESR1 | P03372 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27705172 | 0.89 | PLA2G7 (0.40) | POLBMAPTRAB9ANPC1KDM4E | |
| SCHEMBL1417509 | 0.89 | PLA2G7 (0.40) | POLBMAPTRAB9ANPC1KDM4E | |
| SCHEMBL36764 | 0.87 | KMT2A (0.42) | MAPTRAB9ANPC1KDM4EMEN1 | |
| SCHEMBL36763 | 0.87 | KMT2A (0.42) | MAPTRAB9ANPC1KDM4EMEN1 | |
| SCHEMBL29359430 | 0.87 | KMT2A (0.42) | MAPTRAB9ANPC1KDM4EMEN1 | |
| SCHEMBL7790655 | 0.85 | P2RX7 (0.39) | POLBMAPTPKMRAB9ANPC1 | |
| SCHEMBL7790657 | 0.85 | P2RX7 (0.39) | POLBMAPTPKMRAB9ANPC1 | |
| SCHEMBL4350596 | 0.85 | NPC1 (0.42) | POLBMAPTRAB9ANPC1KDM4E | |
| SCHEMBL30529837 | 0.85 | NPC1 (0.42) | POLBMAPTRAB9ANPC1KDM4E | |
| SCHEMBL4350592 | 0.85 | NPC1 (0.42) | POLBMAPTRAB9ANPC1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108073042-B | Positive photosensitive resin composition | 株式会社东进世美肯 | 2024-01-23 | — | — | CN | disclosed |
| US-9946157-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-17 | — | — | US | disclosed |
| US-20160291464-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-6835530-B2 | Base material for lithography | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-12-28 | — | — | US | disclosed |
| US-20040121260-A1 | Base material for lithography | TOKYO OHKA KOGYO CO., LTD. | 2004-06-24 | — | — | US | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |