Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | F2 | P00734 | 3/20 | 0.40 |
| ▸ | PRSS1 | P07477 | 3/20 | 0.40 |
| ▸ | PRSS2 | P07478 | 3/20 | 0.40 |
| ▸ | PRSS3 | P35030 | 3/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.38 |
| ▸ | PGR | P06401 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.35 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.35 |
| ▸ | HTR6 | P50406 | 2/20 | 0.35 |
| ▸ | HCRTR1 | O43613 | 1/20 | 0.35 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29761878 | 1.00 | F2 (0.40) | F2PRSS1PRSS2PRSS3CA1 | |
| SCHEMBL6741146 | 1.00 | F2 (0.40) | F2PRSS1PRSS2PRSS3CA1 | |
| SCHEMBL30529837 | 0.88 | NPC1 (0.42) | F2PRSS1PRSS2PRSS3MAPT | |
| SCHEMBL4350592 | 0.88 | NPC1 (0.42) | F2PRSS1PRSS2PRSS3MAPT | |
| SCHEMBL4350596 | 0.88 | NPC1 (0.42) | F2PRSS1PRSS2PRSS3MAPT | |
| SCHEMBL27705172 | 0.81 | PLA2G7 (0.40) | PLA2G7MAPTALDH1A1HPGDCYP1A2 | |
| SCHEMBL1417509 | 0.81 | PLA2G7 (0.40) | PLA2G7MAPTALDH1A1HPGDCYP1A2 | |
| SCHEMBL7976575 | 0.79 | KDM4E (0.49) | PLA2G7MAPTALDH1A1HSP90AA1HTT | |
| SCHEMBL92016 | 0.79 | KDM4E (0.49) | PLA2G7MAPTALDH1A1HSP90AA1HTT | |
| SCHEMBL384504 | 0.76 | F2 (0.41) | F2PRSS1PRSS2PRSS3CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6042988-A | ALKALI-SOLUBLE RESIN, A COMPOUND CAPABLE OF GENERATING AN ACID BY IRRADIATION AND A CROSSLINKING AGENT, AND FURTHER CONTAINS AN ORGANIC CARBOXYLIC ACID AS ACIDIC COMPOUND AND ORGANIC AMINE AS ALKALINE COMPOUND; DEFINITION AND PRECISION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-03-28 | — | — | US | claimed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | claimed |
| CN-116583784-A | Resist composition and resist pattern forming method | 东京应化工业株式会社 | 2023-08-11 | — | — | CN | disclosed |
| CN-112987497-A | Resist composition and resist pattern forming method | 东京应化工业株式会社 | 2021-06-18 | — | — | CN | disclosed |
| US-7179399-B2 | Material for forming protective film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-6835530-B2 | Base material for lithography | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-12-28 | — | — | US | disclosed |
| US-20040121260-A1 | Base material for lithography | TOKYO OHKA KOGYO CO., LTD. | 2004-06-24 | — | — | US | disclosed |
| US-6693049-B2 | FILLING WITH AN OXYALKYLATED MELAMINE, BENZOGUANAMINE, ACETOGUANAMINE, GLYCOL URYL, UREA, THIOUREA, GUANIDINE, ALKYLENEUREA OR SUCCINYLAMIDE AND HEATING AT 150-250 C, WHEREBY NO BUBBLE IS GENERATED WHEN THE FINE HOLE IS FILLED. | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| US-6689535-B2 | A NOVALAK RESIN CROSSLINKING AGENT HAVING HYDROXYALKYL AND/OR ALKOXYALKYL GROUPS AND AN ACIDIC COMPOUND; UNDERCOATINGS; A RECTANGULAR CROSS-SECTIONAL PROFILE WITHOUT CAUSING FOOTING, UNDERCUTTING, ETC. AT THE BOTTOM | TOKYO OHKA KOGYO CO., LTD (JP) | 2004-02-10 | — | — | US | disclosed |
| US-20030032280-A1 | Method for filling fine hole | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-13 | — | — | US | disclosed |
| US-20020182360-A1 | Material for forming protective film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-12-05 | — | — | US | disclosed |
| EP-0821274-B1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2001-11-14 | — | — | EP | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |
| US-6245930-B1 | AN OXIMESULFONATE COMPOUND CAPABLE OF GIVING POSITIVELY OR NEGATIVELY PATTERNED RESIST LAYER OF EXCELLENT PATTERN RESOLUTION, CROSS SECTIOANL PROFILE, AND HIGH SENSITIVITY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-06-12 | — | — | US | disclosed |
| US-6042988-A | ALKALI-SOLUBLE RESIN, A COMPOUND CAPABLE OF GENERATING AN ACID BY IRRADIATION AND A CROSSLINKING AGENT, AND FURTHER CONTAINS AN ORGANIC CARBOXYLIC ACID AS ACIDIC COMPOUND AND ORGANIC AMINE AS ALKALINE COMPOUND; DEFINITION AND PRECISION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-03-28 | — | — | US | disclosed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | disclosed |
| US-5928837-A | Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-27 | — | — | US | disclosed |
| US-5817444-A | POLYHYDROXYSTYRENE SUBSTITUTED WITH TETRAHYDROPYRAN GROUPS, POLYHYDROXYSTYRENE SUBSTITUTED WITH ALKOXYALKYL GROUPS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-10-06 | — | — | US | disclosed |
| EP-0848289-A1 | Negative-working chemical sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-06-17 | — | — | EP | disclosed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | disclosed |