SCHEMBL29761878

SCHEMBL29761878

N#CC(=NOS(=O)(=O)c1cccc2ccccc12)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ F2 P00734 3/20 0.40
▸ PRSS1 P07477 3/20 0.40
▸ PRSS2 P07478 3/20 0.40
▸ PRSS3 P35030 3/20 0.40
▸ CA1 P00915 1/20 0.40
▸ CA2 P00918 1/20 0.40
▸ CA9 Q16790 1/20 0.40
▸ TSHR P16473 1/20 0.39
▸ PLA2G7 Q13093 1/20 0.38
▸ PGR P06401 1/20 0.36
▸ MAPT P10636 2/20 0.35
▸ ALDH1A1 P00352 1/20 0.35
▸ HSP90AA1 P07900 1/20 0.35
▸ HPGD P15428 1/20 0.35
▸ HTT P42858 1/20 0.35
▸ KEAP1 Q14145 1/20 0.35
▸ NFE2L2 Q16236 1/20 0.35
▸ HTR6 P50406 2/20 0.35
▸ HCRTR1 O43613 1/20 0.35
▸ SLC1A3 P43003 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5367442 1.00 F2 (0.40) F2PRSS1PRSS2PRSS3CA1
SCHEMBL6741146 1.00 F2 (0.40) F2PRSS1PRSS2PRSS3CA1
SCHEMBL30529837 0.88 NPC1 (0.42) F2PRSS1PRSS2PRSS3MAPT
SCHEMBL4350592 0.88 NPC1 (0.42) F2PRSS1PRSS2PRSS3MAPT
SCHEMBL4350596 0.88 NPC1 (0.42) F2PRSS1PRSS2PRSS3MAPT
SCHEMBL27705172 0.81 PLA2G7 (0.40) PLA2G7MAPTALDH1A1HPGDCYP1A2
SCHEMBL1417509 0.81 PLA2G7 (0.40) PLA2G7MAPTALDH1A1HPGDCYP1A2
SCHEMBL7976575 0.79 KDM4E (0.49) PLA2G7MAPTALDH1A1HSP90AA1HTT
SCHEMBL92016 0.79 KDM4E (0.49) PLA2G7MAPTALDH1A1HSP90AA1HTT
SCHEMBL384504 0.76 F2 (0.41) F2PRSS1PRSS2PRSS3CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120044752-A Photosensitive resin composition 东京应化工业株式会社 2025-05-27 — — CN disclosed
CN-116583784-A Resist composition and resist pattern forming method 东京应化工业株式会社 2023-08-11 — — CN disclosed
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