Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.33 |
| ▸ | NEK2 | P51955 | 1/20 | 0.33 |
| ▸ | PDK2 | Q15119 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.32 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.32 |
| ▸ | DRD2 | P14416 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | FLT3 | P36888 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29904508 | 1.00 | TAAR1 (0.36) | TAAR1POLBGAANPY5RNEK2 | |
| SCHEMBL491288 | 0.86 | CYP1A2 (0.40) | TAAR1GAANEK2PDK2TSHR | |
| SCHEMBL82274 | 0.85 | TAAR1 (0.40) | TAAR1TSHRNPC1TP53RAB9A | |
| SCHEMBL5150338 | 0.83 | ALDH1A1 (0.38) | TAAR1GAANEK2TSHRNPC1 | |
| SCHEMBL8830382 | 0.83 | TAAR1 (0.36) | TAAR1TSHR | |
| SCHEMBL1877506 | 0.83 | TAAR1 (0.40) | TAAR1POLBPDK2NPC1RAB9A | |
| SCHEMBL11594199 | 0.79 | CRHBP (0.37) | TAAR1TSHRALDH1A1 | |
| SCHEMBL490794 | 0.79 | RELA (0.40) | TAAR1GAANPC1RAB9ASMN1; SMN2 | |
| SCHEMBL11268438 | 0.76 | ALDH1A1 (0.43) | NPC1RAB9AALDH1A1KDM4EL3MBTL1 | |
| SCHEMBL1425804 | 0.74 | CYP2A6 (0.40) | TAAR1GAAPDK2TSHRNPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10254646-B2 | Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2019-04-09 | — | — | US | claimed |
| US-20160026080-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2016-01-28 | — | — | US | claimed |
| EP-2937733-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVELOPMENT PROCESS | IBF - Indústria Brasileira de Filmes S/A (BR) | 2015-10-28 | — | — | EP | claimed |
| US-8741536-B2 | Light sensitive coating compositions useful for lithographic elements | IBF Industria Basileira de Filmes S/A (BR) | 2014-06-03 | — | — | US | claimed |
| EP-1673663-B1 | LIGHT SENSITIVE COATING COMPOSITIONS FOR LITHOGRAPHIC ELEMENTS | IBF IND BRASILEIRA DE FILMES SA (BR) | 2011-03-23 | — | — | EP | claimed |
| US-20070202434-A1 | Light Sensitive Coating Compositions Useful For Lithographic Elements | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2007-08-30 | — | — | US | claimed |
| EP-1673663-A1 | LIGHT SENSITIVE COATING COMPOSITIONS USEFUL FOR LITHOGRAPHIC ELEMENTS | IBF Industria Brasileira de Filmes Ltda. (BR) | 2006-06-28 | — | — | EP | claimed |
| WO-2005029186-A1 | LIGHT SENSITIVE COATING COMPOSITIONS USEFUL FOR LITHOGRAPHIC ELEMENTS | IBF Indústria Brasileira de Filmes Ltda. (BR) | 2005-03-31 | — | — | WO | claimed |
| US-10254646-B2 | Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2019-04-09 | — | — | US | disclosed |
| US-10012904-B2 | Lithographic printing plate precursors and coating | Mark'Andy Inc. (US) | 2018-07-03 | — | — | US | disclosed |
| EP-3063591-B1 | LITHOGRAPHIC PRINTING PLATE PRECURSORS AND COATING | ANOCOIL CORP (US) | 2018-04-04 | — | — | EP | disclosed |
| EP-3063591-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSORS AND COATING | Anocoil Corporation (US) | 2016-09-07 | — | — | EP | disclosed |
| US-20160252813-A1 | Lithographic Printing Plate Precursors and Coating | VERICO TECHNOLOGY LLC | 2016-09-01 | — | — | US | disclosed |
| US-20160026080-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2016-01-28 | — | — | US | disclosed |
| US-5800965-A | LIGHT SENSITIVE LITHOGRAPHIC PLATES AND ADDITION POLYMERIZABLE MONOMERS AND PHOSPHORIC ACID DERIVATIVES | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-09-01 | — | — | US | disclosed |
| EP-0851299-A1 | Photosensitive lithographic printing plate | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-07-01 | — | — | EP | disclosed |
| US-5686231-A | Process for disposing of developer for pigment-containing non-silver-salt photo sensitive material, apparatus therefor and automatic developing system | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-11-11 | — | — | US | disclosed |
| EP-0793145-A1 | Photopolymerizable composition for a photosensitive lithographic printing plate and photosensitive lithographic printing plate employing it | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-09-03 | — | — | EP | disclosed |
| EP-0747773-A1 | METHOD AND APPARATUS FOR TREATING DEVELOPER FOR PIGMENT-CONTAINING NONSILVER PHOTOSENSITIVE MATERIAL, AND AUTOMATIC DEVELOPING MACHINE | MITSUBISHI CHEMICAL CORPORATION (JP) | 1996-12-11 | — | — | EP | disclosed |
| EP-0738929-A2 | Photopolymerizable sensitive material | Mitsubishi Chemical Corporation (JP) | 1996-10-23 | — | — | EP | disclosed |