Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL200337 | 0.77 | KDM4E (0.32) | KDM4ELMNA | |
| SCHEMBL4415495 | 0.75 | KDM4E (0.31) | KDM4ELMNA | |
| SCHEMBL7048034 | 0.74 | ALDH1A1 (0.35) | KDM4ELMNA | |
| SCHEMBL11921079 | 0.74 | ALDH1A1 (0.35) | KDM4ELMNA | |
| SCHEMBL15362615 | 0.72 | — | — | |
| SCHEMBL24643274 | 0.72 | LMNA (0.34) | KDM4ELMNA | |
| SCHEMBL203770 | 0.72 | LMNA (0.34) | KDM4ELMNA | |
| SCHEMBL17642429 | 0.71 | LMNA (0.31) | LMNA | |
| SCHEMBL17629736 | 0.71 | LMNA (0.31) | LMNA | |
| SCHEMBL10714009 | 0.71 | LMNA (0.31) | LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9551935-B2 | Pattern forming method and resist composition | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9188865-B2 | Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-20150010857-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-01-08 | — | — | US | disclosed |
| US-20130011785-A1 | PATTERN FORMING METHOD AND RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-10 | — | — | US | disclosed |