Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15362615 | 0.87 | — | — | |
| SCHEMBL200337 | 0.84 | KDM4E (0.32) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL11921079 | 0.80 | ALDH1A1 (0.35) | KDM4ELMNAALDH1A1TDP1 | |
| SCHEMBL7048034 | 0.80 | ALDH1A1 (0.35) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL24643274 | 0.78 | LMNA (0.34) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL203770 | 0.78 | LMNA (0.34) | KDM4ELMNAALDH1A1GAATDP1 | |
| SCHEMBL10714009 | 0.77 | LMNA (0.31) | LMNA | |
| SCHEMBL17642429 | 0.77 | LMNA (0.31) | LMNA | |
| SCHEMBL17629736 | 0.77 | LMNA (0.31) | LMNA | |
| SCHEMBL14554272 | 0.75 | KDM4E (0.32) | KDM4ELMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9323146-B2 | Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base | JSR CORPORATION (JP) | 2016-04-26 | — | — | US | disclosed |
| US-9304393-B2 | Radiation-sensitive resin composition and compound | JSR CORPORATION (JP) | 2016-04-05 | — | — | US | disclosed |
| US-9304393-B2 | Radiation-sensitive resin composition and compound | JSR CORPORATION (JP) | 2016-04-05 | — | — | US | disclosed |
| US-20140363769-A1 | PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, ACID GENERATING AGENT, AND PHOTODEGRADABLE BASE | JSR CORPORATION (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20130288179-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2013-10-31 | — | — | US | disclosed |
| US-20130288179-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2013-10-31 | — | — | US | disclosed |
| US-20100324329-A1 | COMPOUND | JSR CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| EP-1270553-B1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORP (JP) | 2009-11-18 | — | — | EP | disclosed |
| US-6908722-B2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-06-21 | — | — | US | disclosed |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| EP-1270553-A2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-01-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20140363769-A1 | PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, ACID GENERATING AGENT, AND PHOTODEGRADABLE BASE | FRG1, FGFR1, IGF1R | KDM4E 2848/4885LMNA 1844/4885ALDH1A1 435/4885 |
| US-20100324329-A1 | COMPOUND | AFF2, AFF1, AFF4 | KDM4E 3442/4885LMNA 1517/4885ALDH1A1 2783/4885 |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | ASIC1, PFAS, RARA | KDM4E 4264/4885LMNA 3265/4885ALDH1A1 1216/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.