SCHEMBL14593293

SCHEMBL14593293

O=C(O)c1cc(C(O)(C(F)(F)F)C(F)(F)F)cc(C(O)(C(F)(F)F)C(F)(F)F)c1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.45
RXRA P19793 1/20 0.44
RXRB P28702 1/20 0.44
RXRG P48443 1/20 0.44
SRD5A2 P31213 2/20 0.41
NR1H3 Q13133 2/20 0.40
NR1H2 P55055 1/20 0.40
MLYCD O95822 4/20 0.40
RORC P51449 1/20 0.40
CA12 O43570 2/20 0.39
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
CA7 P43166 2/20 0.39
CA9 Q16790 2/20 0.39
CA14 Q9ULX7 2/20 0.39
SMN1; SMN2 Q16637 3/20 0.39
LCK P06239 1/20 0.39
FYN P06241 1/20 0.39
TPMT P51580 2/20 0.38
KDM4E B2RXH2 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1333906 0.96 LCK (0.43) CES2RXRARXRBRXRGSRD5A2
Hydrochloric Acid SCHEMBL15948160 0.94 LCK (0.42) CES2RXRARXRBRXRGSRD5A2
SCHEMBL3661937 0.87 NOTUM (0.46) CES2RXRARXRBRXRGSRD5A2
SCHEMBL8586265 0.81 NR1H2 (0.48) NR1H3NR1H2MLYCDRORCSMN1; SMN2
SCHEMBL503980 0.79 CES2 (0.70) CES2RXRARXRBRXRGSRD5A2
SCHEMBL3066349 0.79 RXRA (0.50) RXRARXRBRXRGMLYCDCA2
SCHEMBL1512711 0.78 SRD5A2 (0.59) SRD5A2NR1H3NR1H2MLYCDRORC
SCHEMBL28119413 0.77 CES2 (0.67) CES2RXRARXRBRXRGSRD5A2
Hydrochloric Acid SCHEMBL7485970 0.77 CES2 (0.67) CES2RXRARXRBRXRGSRD5A2
SCHEMBL15948159 0.77 CES2 (0.39) CES2NR1H3NR1H2MLYCDRORC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200192220-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2020-06-18 US disclosed
US-7169869-B2 Polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 US disclosed
US-7169869-B2 Polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 US disclosed