SCHEMBL1469936

SCHEMBL1469936

c1cc2ccc1-2.c1ccc([S+](c2ccccc2)c2cccs2)cc1

nearest known ligand 0.32

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.32
CYP2E1 P05181 1/20 0.31
CYP2A6 P11509 1/20 0.31
CYP2B6 P20813 1/20 0.31
KIF11 P52732 1/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
HPGDS O60760 1/20 0.31
LTA4H P09960 1/20 0.31
HDAC3 O15379 1/20 0.30
HDAC1 Q13547 1/20 0.30
DAO P14920 1/20 0.30
KDM4E B2RXH2 1/20 0.30
MAPT P10636 1/20 0.30
MAPK1 P28482 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP3A4 P08684 1/20 0.30
TAAR1 Q96RJ0 1/20 0.30
HSD17B10 Q99714 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL246867 0.94 KMT2A (0.33) ALDH1A1MEN1KMT2AHPGDSDAO
SCHEMBL4761802 0.89 KMT2A (0.33) ALDH1A1MEN1KMT2AHPGDSDAO
SCHEMBL31369338 0.86 MEN1 (0.30) MEN1KMT2A
Trifluoroacetic Acid SCHEMBL1470565 0.84 HDAC6 (0.37) KIF11HPGDSHDAC3HDAC1DAO
Trifluoromethanesulfonic Acid SCHEMBL6653041 0.77 GPR3 (0.40) ALDH1A1MEN1KMT2A
SCHEMBL12762162 0.77 FBP1 (0.39) ALDH1A1MEN1KMT2ALTA4HHDAC1
SCHEMBL29515962 0.73 LTA4H (0.50) ALDH1A1CYP2E1CYP2A6CYP2B6MEN1
Trifluoromethanesulfonic Acid SCHEMBL6654028 0.73 GPR3 (0.40) MEN1KMT2A
SCHEMBL12432033 0.71 ALDH1A1 (0.47) ALDH1A1KIF11MAPTMAPK1CYP1A2
SCHEMBL755709 0.69 HDAC6 (0.39) ALDH1A1CYP2E1CYP2A6CYP2B6MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024204692-A1 RESIN COMPOSITION, TRANSPARENT MATERIAL, TRANSPARENT FILM, PLATE MATERIAL FOR SCREEN PRINTING, STENCIL FOR SCREEN PRINTING, AND PHOTOSENSITIVE RESIST FILM 株式会社ムラカミ 2024-10-03 WO disclosed
WO-2022215283-A1 LAYERED FILM FOR PATTERN FORMATION, NON-PHOTOSENSITIVE SCREEN PRINTING PLATE, AND METHOD FOR MANUFACTURING SAME 株式会社 ムラカミ 2022-10-13 WO disclosed
WO-2021141037-A1 METHOD FOR PRODUCING POLARIZING FILM 日東電工株式会社 2021-07-15 WO disclosed
EP-1553449-B1 ACTIVE ENERGY RAY SENSITIVE RESIN COMPOSITION, ACTIVE ENERGY RAY SENSITIVE RESIN FILM AND METHOD FOR FORMING PATTERN USING SAID FILM MURAKAMI CO LTD (JP) 2016-01-20 EP disclosed
US-8303861-B2 Colored composite microparticles, process for producing the colored composite microparticles, colorant, color filter and ink for ink-jet printing TODA KOGYO CORPORATION (JP) 2012-11-06 US disclosed
US-20110068307-A1 Colored composite microparticles, process for producing the colored composite microparticles, colorant, color filter and ink for ink-jet printing TODA KOGYO CORPORATION (JP) 2011-03-24 US disclosed
US-20080258118-A1 Colored composite microparticles, process for producing the colored composite microparticles, colorant, color filter and ink for ink-jet printing TODA KOGYO CORPORATION (JP) 2008-10-23 US disclosed
EP-1930380-A1 COLORED COMPOSITE MICROPARTICLE, METHOD FOR PRODUCTION OF COLORED COMPOSITE MICROPARTICLE, COLORING MATERIAL, COLOR FILTER, AND INK-JET INK Toda Kogyo Corporation (JP) 2008-06-11 EP disclosed
US-7157025-B2 Transparent coloring composition and color filter TODA KOGYO CORPORATION (JP) 2007-01-02 US disclosed
US-20050227166-A1 Active energy ray sensitive resin composition, active energy ray sensitive resin film and method for forming pattern using said film MURAKAMI CO., LTD. (JP) 2005-10-13 US disclosed
EP-1553449-A1 ACTIVE ENERGY RAY SENSITIVE RESIN COMPOSITION, ACTIVE ENERGY RAY SENSITIVE RESIN FILM AND METHOD FOR FORMING PATTERN USING SAID FILM Murakami Co., Ltd. (JP) 2005-07-13 EP disclosed
US-20040235985-A1 Transparent coloring composition and color filter TODA KOGYO CORPORATION (JP) 2004-11-25 US disclosed
EP-1462486-A2 Transparent coloring composition and color filter Toda Kogyo Corporation (JP) 2004-09-29 EP disclosed
US-6656660-B1 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-12-02 US disclosed
EP-1024406-A1 Resist composition WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 2000-08-02 EP disclosed
EP-0353030-B1 Photopolymerization initiator and photosensitive composition employing the same CANON KK (JP) 1995-03-15 EP disclosed
US-5124235-A Photopolymerization initiator and photosensitive composition employing the same CANON KABUSHIKI KAISHA (JP) 1992-06-23 US disclosed
EP-0353030-A2 Photopolymerization initiator and photosensitive composition employing the same CANON KABUSHIKI KAISHA (JP) 1990-01-31 EP disclosed