Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | HPGDS | O60760 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | DAO | P14920 | 1/20 | 0.33 |
| ▸ | FBP1 | P09467 | 1/20 | 0.32 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.32 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.32 |
| ▸ | G6PC1 | P35575 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | HPGD | P15428 | 2/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | NOS1 | P29475 | 1/20 | 0.31 |
| ▸ | ERCC5 | P28715 | 1/20 | 0.31 |
| ▸ | FEN1 | P39748 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | CES2 | O00748 | 1/20 | 0.30 |
| ▸ | CES1 | P23141 | 1/20 | 0.30 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.30 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4761802 | 0.95 | KMT2A (0.33) | KMT2AHPGDSMEN1DAOFBP1 | |
| SCHEMBL1469936 | 0.94 | ALDH1A1 (0.32) | KMT2AHPGDSMEN1DAOALDH1A1 | |
| SCHEMBL31369338 | 0.92 | MEN1 (0.30) | KMT2AMEN1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6653041 | 0.82 | GPR3 (0.40) | KMT2AMEN1ALDH1A1 | |
| SCHEMBL12762162 | 0.82 | FBP1 (0.39) | KMT2AMEN1DAOFBP1ALDH1A1 | |
| Trifluoroacetic Acid SCHEMBL1470565 | 0.79 | HDAC6 (0.37) | HPGDSDAOCES1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6654028 | 0.78 | GPR3 (0.40) | KMT2AMEN1 | |
| SCHEMBL1251856 | 0.70 | MEN1 (0.32) | KMT2AHPGDSMEN1DAO | |
| SCHEMBL4763480 | 0.70 | ALDH1A1 (0.31) | KMT2AALDH1A1HPGDHTT | |
| SCHEMBL29515962 | 0.70 | LTA4H (0.50) | KMT2AMEN1ALDH1A1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 210 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| US-6696216-B2 | A PHOTO ACID GENERATOR USED IN GENERATING AN ACID FOR CHEMICALLY CLEAVING ACID SENSITIVE SIDE CHAINS OF A CHEMICALLY AMPLIFIED BASE POLYMER CONTAINS A SULFONIUM OR IODONIUM SALT CONTAINING ATLEAST ONE THIOPHENE RING | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-02-24 | — | — | US | claimed |
| US-20030008230-A1 | Thiophene-containing photo acid generators for photolithography | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-01-09 | — | — | US | claimed |
| WO-2003003120-A1 | THIOPHENE-CONTAINING PHOTO ACID GENERATORS FOR PHOTOLITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2003-01-09 | — | — | WO | claimed |
| US-20260093177-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-02 | — | — | US | disclosed |
| US-12535737-B2 | Material for forming adhesive film, patterning process, and method for forming adhesive film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-27 | — | — | US | disclosed |
| EP-4674837-A1 | HETEROPOLYOXOTUNGSTATE COMPOUND, SOLVATE THEREOF, OR MIXTURE OF SAID COMPOUND AND SOLVATE, AND METHOD FOR PRODUCING SAID COMPOUND, SOLVATE, OR MIXTURE | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2026-01-07 | — | — | EP | disclosed |
| EP-4202548-B1 | MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD FOR FORMING ADHESIVE FILM | SHINETSU CHEMICAL CO (JP) | 2025-11-19 | — | — | EP | disclosed |
| EP-4635963-A1 | ISOPOLYOXOTUNGSTATE SALT COMPOUND, SOLVATE THEREOF OR MIXTURE OF SAID COMPOUND AND SOLVATE, AND METHOD FOR PRODUCING SAID COMPOUND, SOLVATE OR MIXTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-10-22 | — | — | EP | disclosed |
| US-12351742-B2 | Material for forming adhesive film, patterning process, and method for forming adhesive film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-08 | — | — | US | disclosed |
| US-12174536-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-12-24 | — | — | US | disclosed |
| EP-1780199-A1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-05-02 | — | — | EP | disclosed |
| US-20060228648-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2006-10-12 | — | — | US | disclosed |
| EP-1710230-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2006-10-11 | — | — | EP | disclosed |
| US-20050260522-A1 | Permanent resist composition, cured product thereof, and use thereof | MICROCHEM CORP. | 2005-11-24 | — | — | US | disclosed |
| US-6696216-B2 | A PHOTO ACID GENERATOR USED IN GENERATING AN ACID FOR CHEMICALLY CLEAVING ACID SENSITIVE SIDE CHAINS OF A CHEMICALLY AMPLIFIED BASE POLYMER CONTAINS A SULFONIUM OR IODONIUM SALT CONTAINING ATLEAST ONE THIOPHENE RING | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-02-24 | — | — | US | disclosed |
| US-20030008230-A1 | Thiophene-containing photo acid generators for photolithography | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-01-09 | — | — | US | disclosed |
| WO-2003003120-A1 | THIOPHENE-CONTAINING PHOTO ACID GENERATORS FOR PHOTOLITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2003-01-09 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260093177-A1 | PATTERNING PROCESS | ARFGAP1, ARF1, ARF4 | KMT2A 893/4885HPGDS 3805/4885MEN1 502/4885 |
| US-12535737-B2 | Material for forming adhesive film, patterning process, and method for forming adhesive film | RAD51, CDH1, SMC2 | KMT2A 714/4885HPGDS 2968/4885MEN1 2010/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.