SCHEMBL14701417

SCHEMBL14701417

O=C(OCC(O)COC(=O)C12CC3CC(C1)C(OC(=O)C(F)(F)S(=O)(=O)O)C(C3)C2)C1C2CC3CC1CC(O)(C3)C2

nearest known ligand 0.37

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.37
PRKCA P17252 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14701500 0.89 PKM (0.46) PKMPRKCA
SCHEMBL14700557 0.88 PKM (0.37) PKMPRKCA
SCHEMBL14701487 0.87 PKM (0.41) PKMPRKCA
SCHEMBL14701492 0.85 PKM (0.42) PKMPRKCA
SCHEMBL14701503 0.85 PKM (0.42) PKMPRKCA
SCHEMBL14701491 0.84 PKM (0.37) PKMPRKCA
SCHEMBL14701397 0.83 PKM (0.40) PKMPRKCA
SCHEMBL4404944 0.79 HSD11B1 (0.38)
SCHEMBL14731093 0.79 PRKCA (0.45) PKMPRKCA
SCHEMBL14701501 0.77 PKM (0.53) PKMPRKCA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8802352-B2 Salt, photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-08-12 US disclosed
US-20130040239-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-02-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130040239-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN CRY1, H1-0, SPIN1 PKM 3615/4885PRKCA 2560/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.