SCHEMBL14701492

SCHEMBL14701492

O=C(OCC(O)CO)C12CC3CC(C1)C(OC(=O)C(F)(F)S(=O)(=O)O)C(C3)C2

nearest known ligand 0.42

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.42
PRKCA P17252 1/20 0.41
ALDH1A1 P00352 2/20 0.31
GAA P10253 1/20 0.31
SCN9A Q15858 2/20 0.31
HSD11B1 P28845 1/20 0.31
MEN1 O00255 1/20 0.30
MAPT P10636 1/20 0.30
KMT2A Q03164 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14701500 0.94 PKM (0.46) PKMPRKCAALDH1A1GAASCN9A
SCHEMBL14701397 0.88 PKM (0.40) PKMPRKCASCN9A
SCHEMBL14701487 0.86 PKM (0.41) PKMPRKCAALDH1A1GAANPSR1
SCHEMBL14700531 0.86 PRKCA (0.43) PKMPRKCAALDH1A1SCN9AHSD11B1
SCHEMBL14701503 0.86 PKM (0.42) PKMPRKCA
SCHEMBL14701491 0.85 PKM (0.37) PKMPRKCA
SCHEMBL14701417 0.85 PKM (0.37) PKMPRKCA
SCHEMBL14727852 0.84 PRKCA (0.45) PKMPRKCAALDH1A1HSD11B1MEN1
SCHEMBL13470447 0.82 ALDH1A1 (0.34) PKMPRKCAALDH1A1GAASCN9A
SCHEMBL12947969 0.82 HSD11B1 (0.36) PKMPRKCAALDH1A1GAASCN9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8802352-B2 Salt, photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-08-12 US disclosed
US-8741544-B2 Salt, photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-06-03 US disclosed
US-20130052588-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-02-28 US disclosed
US-20130040239-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-02-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130040239-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN CRY1, H1-0, SPIN1 PKM 3615/4885PRKCA 2560/4885ALDH1A1 1898/4885
US-20130052588-A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN RER1, COL1A1, H1-0 PKM 4340/4885PRKCA 2755/4885ALDH1A1 1936/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.