SCHEMBL16285463

SCHEMBL16285463

O=C1OC(c2ccc(O)cc2O)(c2ccc(O)cc2O)c2ccccc21

nearest known ligand 0.73

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 6/20 0.73
LMNA P02545 5/20 0.73
MEN1 O00255 5/20 0.73
KMT2A Q03164 5/20 0.73
TDP1 Q9NUW8 4/20 0.73
FTO Q9C0B1 3/20 0.73
GPR55 Q9Y2T6 2/20 0.73
POLB P06746 2/20 0.73
NPSR1 Q6W5P4 2/20 0.73
CYP2C19 P33261 2/20 0.73
RECQL P46063 2/20 0.73
BLM P54132 2/20 0.73
PRMT1 Q99873 2/20 0.73
ACE2 Q9BYF1 2/20 0.73
HTT P42858 2/20 0.73
ALOX12 P18054 1/20 0.73
HPGD P15428 1/20 0.73
SMAD3 P84022 1/20 0.73
SMN1; SMN2 Q16637 2/20 0.64
TP53 P04637 2/20 0.64

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9440019 0.90 MAPT (0.77) MAPTLMNAMEN1KMT2ATDP1
SCHEMBL6526046 0.84 GNG2 (0.64) MAPTLMNAMEN1KMT2ATDP1
Fluorescein SCHEMBL30272223 0.84 FTO (1.00) MAPTLMNAMEN1KMT2ATDP1
Fluorescein SCHEMBL16533 0.84 FTO (1.00) MAPTLMNAMEN1KMT2ATDP1
SCHEMBL7805702 0.84 MAPT (1.00) MAPTLMNAMEN1KMT2ATDP1
Fluorescein SCHEMBL29371199 0.84 FTO (1.00) MAPTLMNAMEN1KMT2ATDP1
Fluorescein SCHEMBL29388667 0.84 FTO (1.00) MAPTLMNAMEN1KMT2ATDP1
Fluorescein SCHEMBL3645090 0.84 FTO (1.00) MAPTLMNAMEN1KMT2ATDP1
SCHEMBL11303073 0.84 LMNA (0.65) MAPTLMNAMEN1KMT2ATDP1
SCHEMBL14749082 0.84 MAPT (0.64) MAPTLMNAMEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10228621-B2 Underlayer film-forming composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-03-12 US disclosed
EP-2813889-A2 Photoresist underlayer film-forming composition and pattern forming process Shin-Etsu Chemical Co., Ltd. (JP) 2014-12-17 EP disclosed
US-20140363955-A1 UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-11 US disclosed
US-20140363955-A1 UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-11 US disclosed