SCHEMBL14770321

SCHEMBL14770321

O=C(COC12CC3CC(C1)CC(C(=O)OCCC(F)(F)C(F)(F)S(=O)(=O)O)(C3)C2)OCN1C(=O)c2ccccc2C1=O

nearest known ligand 0.35

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.35
KMT2A Q03164 2/20 0.35
GAA P10253 2/20 0.33
MEN1 O00255 1/20 0.32
L3MBTL1 Q9Y468 2/20 0.32
POLB P06746 1/20 0.32
CYP1A2 P05177 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2C19 P33261 1/20 0.31
LMNA P02545 1/20 0.31
RXFP1 Q9HBX9 1/20 0.31
TP53 P04637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14770322 0.88 ALDH1A1 (0.32) ALDH1A1GAAL3MBTL1POLBLMNA
SCHEMBL14770324 0.85 ALDH1A1 (0.38) ALDH1A1KMT2AGAAMEN1L3MBTL1
SCHEMBL14770314 0.79 NPSR1 (0.37) ALDH1A1
SCHEMBL14770347 0.76 NPSR1 (0.40) ALDH1A1KMT2AMEN1L3MBTL1RXFP1
SCHEMBL14760516 0.75 NPSR1 (0.40) ALDH1A1KMT2AMEN1L3MBTL1RXFP1
SCHEMBL14770325 0.73 LMNA (0.35) ALDH1A1KMT2AGAAMEN1L3MBTL1
SCHEMBL24268504 0.73 NPSR1 (0.41) ALDH1A1KMT2AMEN1L3MBTL1
SCHEMBL14770316 0.73 NPSR1 (0.41) ALDH1A1KMT2AMEN1L3MBTL1RXFP1
SCHEMBL14773963 0.73 NPSR1 (0.39) ALDH1A1KMT2AMEN1L3MBTL1
SCHEMBL14760530 0.73 ALDH1A1 (0.34) ALDH1A1KMT2AGAAMEN1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130244185-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-09-19 US disclosed
US-20130244185-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-09-19 US disclosed
US-20130065186-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-03-14 US disclosed
US-20130065186-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-03-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130244185-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT GLRA3, RER1, RXRG ALDH1A1 2289/4885KMT2A 4267/4885GAA 1539/4885
US-20130065186-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT GLRA3, RER1, FPR3 ALDH1A1 2387/4885KMT2A 4261/4885GAA 1552/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.