SCHEMBL14770324

SCHEMBL14770324

O=C(COC12CC3CC(C1)CC(C(=O)OCCC(F)(F)C(F)(F)S(=O)(=O)O)(C3)C2)OCc1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.38
TP53 P04637 1/20 0.38
RECQL P46063 1/20 0.36
CYP17A1 P05093 2/20 0.35
CYP19A1 P11511 2/20 0.35
HTT P42858 1/20 0.35
GAA P10253 2/20 0.35
EPHX2 P34913 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.34
LMNA P02545 5/20 0.34
NPSR1 Q6W5P4 2/20 0.32
MEN1 O00255 1/20 0.32
MAPT P10636 1/20 0.32
KMT2A Q03164 1/20 0.32
ABL1 P00519 1/20 0.31
TSHR P16473 1/20 0.31
RIN1 Q13671 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14770325 0.86 LMNA (0.35) ALDH1A1TP53RECQLCYP17A1CYP19A1
SCHEMBL14770321 0.85 ALDH1A1 (0.35) ALDH1A1TP53GAAL3MBTL1LMNA
SCHEMBL14770314 0.82 NPSR1 (0.37) ALDH1A1NPSR1
SCHEMBL14770347 0.79 NPSR1 (0.40) ALDH1A1SMN1; SMN2L3MBTL1NPSR1MEN1
SCHEMBL14760516 0.78 NPSR1 (0.40) ALDH1A1SMN1; SMN2L3MBTL1NPSR1MEN1
SCHEMBL14760530 0.78 ALDH1A1 (0.34) ALDH1A1TP53HTTGAAL3MBTL1
SCHEMBL14770349 0.77 NPSR1 (0.38) ALDH1A1L3MBTL1NPSR1MEN1KMT2A
SCHEMBL22043550 0.76 NPSR1 (0.45) ALDH1A1HTTGAAL3MBTL1LMNA
SCHEMBL14760564 0.76 NPSR1 (0.37) ALDH1A1NPSR1
SCHEMBL24268504 0.76 NPSR1 (0.41) ALDH1A1L3MBTL1NPSR1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130244185-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-09-19 US disclosed
US-20130244185-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-09-19 US disclosed
US-20130065186-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-03-14 US disclosed
US-20130065186-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-03-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130244185-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT GLRA3, RER1, RXRG ALDH1A1 2289/4885TP53 2554/4885RECQL 293/4885
US-20130065186-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT GLRA3, RER1, FPR3 ALDH1A1 2387/4885TP53 2563/4885RECQL 306/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.