SCHEMBL14838178

SCHEMBL14838178

CC[Si](C)(C)CCCc1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 1/20 0.47
HTR1A P08908 1/20 0.47
ADRA2A P08913 1/20 0.47
CHRM1 P11229 1/20 0.47
DRD1 P21728 1/20 0.47
SLC6A2 P23975 1/20 0.47
SLC6A4 P31645 1/20 0.47
ADRA1A P35348 1/20 0.47
OPRM1 P35372 1/20 0.47
DRD3 P35462 1/20 0.47
SLC6A3 Q01959 1/20 0.47
KCNH2 Q12809 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.44
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
SIGMAR1 Q99720 4/20 0.43
MAOA P21397 1/20 0.43
AOC3 Q16853 1/20 0.42
MAOB P27338 1/20 0.42
HTR2A P28223 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28533392 0.83 L3MBTL1 (0.44) CHRM2HTR1AADRA2ACHRM1DRD1
SCHEMBL28958133 0.81 CHRM2 (0.48) CHRM2HTR1AADRA2ACHRM1DRD1
SCHEMBL16216219 0.80 L3MBTL1 (0.48) CHRM2HTR1AADRA2ACHRM1DRD1
SCHEMBL31355423 0.78 CHRM2 (0.46) CHRM2HTR1AADRA2ACHRM1DRD1
SCHEMBL5804123 0.78 ADRA1A (0.46) CHRM2HTR1AADRA2ACHRM1DRD1
Hydrochloric Acid SCHEMBL8969155 0.77 ALDH1A1 (0.32) CHRM2ADRA2ACHRM1SLC6A2SLC6A4
SCHEMBL524107 0.77 L3MBTL1 (0.45) CHRM2HTR1AADRA2ACHRM1DRD1
SCHEMBL4494440 0.77 ADRA1A (0.47) CHRM2HTR1AADRA2ACHRM1DRD1
SCHEMBL523288 0.77 L3MBTL1 (0.45) CHRM2HTR1AADRA2ACHRM1DRD1
SCHEMBL4494444 0.77 HDAC3 (0.47) ADRA1ASLC6A3L3MBTL1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9323150-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern FUJIFILM CORPORATION (JP) 2016-04-26 US disclosed
US-9323150-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern FUJIFILM CORPORATION (JP) 2016-04-26 US disclosed
US-20140227636-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2014-08-14 US disclosed
US-20140227636-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2014-08-14 US disclosed
WO-2013047902-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2013-04-04 WO disclosed