Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.45 |
| ▸ | GAA | P10253 | 3/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.45 |
| ▸ | MEN1 | O00255 | 3/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.43 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.43 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.43 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.43 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | HTR2A | P28223 | 4/20 | 0.41 |
| ▸ | CDK2 | P24941 | 1/20 | 0.37 |
| ▸ | MAOA | P21397 | 2/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.37 |
| ▸ | THRB | P10828 | 2/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.37 |
| ▸ | HPGD | P15428 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1041519 | 0.87 | HSD17B10 (0.41) | MAPTGAAKDM4EMEN1KMT2A | |
| SCHEMBL30226846 | 0.87 | HSD17B10 (0.41) | MAPTGAAKDM4EMEN1KMT2A | |
| SCHEMBL8974670 | 0.79 | KDM4E (0.53) | MAPTGAAKDM4EPOLBMEN1 | |
| SCHEMBL27414872 | 0.79 | ALDH1A1 (0.44) | MAPTGAAKDM4EPOLBMEN1 | |
| SCHEMBL25248681 | 0.78 | JAK2 (0.39) | MAPTGAAKDM4EMEN1KMT2A | |
| SCHEMBL30305279 | 0.78 | JAK2 (0.39) | MAPTGAAKDM4EMEN1KMT2A | |
| SCHEMBL10040381 | 0.78 | MAPT (0.56) | MAPTGAAMEN1KMT2AALDH1A1 | |
| SCHEMBL7764568 | 0.78 | CNR1 (0.39) | MAPTGAAKDM4EMEN1KMT2A | |
| SCHEMBL13837650 | 0.78 | HSD17B10 (0.42) | MAPTGAAKDM4EMEN1KMT2A | |
| SCHEMBL6138836 | 0.76 | ALDH1A1 (0.50) | MAPTKDM4EMEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9551932-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9551932-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9213235-B2 | Patterning process, resist composition, polymer, and monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-15 | — | — | US | disclosed |
| US-9213235-B2 | Patterning process, resist composition, polymer, and monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-15 | — | — | US | disclosed |
| US-9182668-B2 | Patterning process, resist composition, polymer, and monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-10 | — | — | US | disclosed |
| US-9182668-B2 | Patterning process, resist composition, polymer, and monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-10 | — | — | US | disclosed |
| US-9104105-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-11 | — | — | US | disclosed |
| US-9104105-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-11 | — | — | US | disclosed |
| US-9086624-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-21 | — | — | US | disclosed |
| US-9081290-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-14 | — | — | US | disclosed |
| US-20110236831-A1 | ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110236831-A1 | ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110065857-A1 | Fluorine-Containing Polymer and Anti-Static Agent Wherein Same is Used | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| EP-2289954-A1 | FLUORINE-CONTAINING POLYMER AND ANTI-STATIC AGENT WHEREIN SAME IS USED | Central Glass Company, Limited (JP) | 2011-03-02 | — | — | EP | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | FGFR2, RTF1, ADGRF1 | MAPT 2903/4885GAA 3912/4885KDM4E 375/4885 |
| US-20110236831-A1 | ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | ADH1A, ADH1C, ADH5 | MAPT 29/4885GAA 3142/4885KDM4E 1704/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.