Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIRT2 | Q8IXJ6 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.31 |
| ▸ | GABRG2 | P18507 | 2/20 | 0.31 |
| ▸ | GABRB3 | P28472 | 2/20 | 0.31 |
| ▸ | GABRA5 | P31644 | 2/20 | 0.31 |
| ▸ | GABRA3 | P34903 | 2/20 | 0.31 |
| ▸ | GABRA2 | P47869 | 2/20 | 0.31 |
| ▸ | GABRA4 | P48169 | 2/20 | 0.31 |
| ▸ | GABRA6 | Q16445 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26063406 | 0.84 | SIRT2 (0.33) | SIRT2EPHX2 | |
| SCHEMBL382685 | 0.79 | TSHR (0.47) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL6449938 | 0.78 | TSHR (0.42) | EPHX2 | |
| SCHEMBL482458 | 0.78 | TSHR (0.46) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| Hydrogen Sulfide SCHEMBL2882266 | 0.78 | TSHR (0.46) | GABRA1GABRG2GABRB3GABRA5GABRA3 | |
| SCHEMBL18785726 | 0.78 | CA12 (0.49) | — | |
| SCHEMBL18785976 | 0.78 | MAPT (0.37) | — | |
| SCHEMBL18785970 | 0.77 | CES2 (0.44) | — | |
| SCHEMBL15216335 | 0.77 | LMNA (0.39) | — | |
| SCHEMBL18785819 | 0.77 | GABRA1 (0.38) | GABRA1GABRG2GABRB3GABRA5GABRA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11579529-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-14 | — | — | US | disclosed |
| US-20200285152-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-09-10 | — | — | US | disclosed |
| US-8900796-B2 | Acid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| US-8900796-B2 | Acid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| US-20130224657-A1 | ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130224657-A1 | ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200285152-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | POLR1C, EWSR1, LBR | SIRT2 4535/4885EPHX2 4525/4885GABRA1 2282/4885 |
| US-11579529-B2 | Positive resist composition and patterning process | POLR1C, EWSR1, LBR | SIRT2 4535/4885EPHX2 4525/4885GABRA1 2282/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.