SCHEMBL15216337

SCHEMBL15216337

CCCN(CCC)c1ccc(C(=O)OC(C(F)(F)F)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EGFR P00533 2/20 0.39
ERBB2 P04626 2/20 0.39
ESRRG P62508 2/20 0.36
MLYCD O95822 3/20 0.36
UTS2R Q9UKP6 1/20 0.35
RORC P51449 1/20 0.35
L3MBTL1 Q9Y468 2/20 0.35
CNR2 P34972 1/20 0.34
MAPT P10636 2/20 0.33
NPSR1 Q6W5P4 2/20 0.33
ALDH1A1 P00352 2/20 0.33
TSHR P16473 2/20 0.32
AR P10275 1/20 0.32
LMNA P02545 1/20 0.32
CYP3A4 P08684 1/20 0.32
HSD17B10 Q99714 1/20 0.32
RAB9A P51151 2/20 0.32
CA12 O43570 1/20 0.32
CA2 P00918 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15216338 0.93 EGFR (0.41) EGFRERBB2MLYCDL3MBTL1CNR2
SCHEMBL15216348 0.90 ALDH1A1 (0.40) L3MBTL1CNR2MAPTALDH1A1TSHR
SCHEMBL15216342 0.90 L3MBTL1 (0.32) EGFRERBB2ESRRGMLYCDUTS2R
SCHEMBL15216349 0.89 CYP4F2 (0.33) MLYCDUTS2RRORCL3MBTL1MAPT
SCHEMBL26063433 0.88 EGFR (0.39) EGFRERBB2ESRRGMLYCDUTS2R
SCHEMBL15216343 0.87 L3MBTL1 (0.33) EGFRERBB2L3MBTL1MAPTNPSR1
SCHEMBL15216329 0.83 ALDH1A1 (0.41) L3MBTL1MAPTALDH1A1TSHRLMNA
SCHEMBL15216346 0.82 HPGD (0.32) MAPTALDH1A1LMNARAB9ACA2
SCHEMBL18775935 0.82 EGFR (0.38) EGFRERBB2ESRRGMLYCDUTS2R
SCHEMBL18785967 0.82 POLB (0.43) MAPTNPSR1ALDH1A1TSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11579529-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-02-14 US disclosed
US-20200285152-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-09-10 US disclosed
US-20170115566-A1 RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-27 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170115566-A1 RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS CASR, LIFR, LBR EGFR 350/4885ERBB2 2284/4885ESRRG 80/4885
US-20200285152-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS POLR1C, EWSR1, LBR EGFR 174/4885ERBB2 1189/4885ESRRG 1762/4885
US-11579529-B2 Positive resist composition and patterning process POLR1C, EWSR1, LBR EGFR 174/4885ERBB2 1189/4885ESRRG 1762/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.