SCHEMBL15216348

SCHEMBL15216348

CCN(CC)c1ccc(C(=O)OC(C(F)(F)F)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.40
MEN1 O00255 5/20 0.40
KMT2A Q03164 5/20 0.40
L3MBTL1 Q9Y468 5/20 0.40
HPGD P15428 3/20 0.40
HSP90AA1 P07900 2/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
HSD11B1 P28845 1/20 0.40
MAPT P10636 5/20 0.38
POLB P06746 3/20 0.38
GAA P10253 2/20 0.38
MCL1 Q07820 1/20 0.38
NOX1 Q9Y5S8 1/20 0.38
TLR9 Q9NR96 1/20 0.37
TSHR P16473 1/20 0.37
CNR2 P34972 2/20 0.36
THRB P10828 2/20 0.36
PKM P14618 2/20 0.36
MAPK1 P28482 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15216337 0.90 EGFR (0.39) ALDH1A1L3MBTL1MAPTTSHRCNR2
SCHEMBL15216338 0.88 EGFR (0.41) ALDH1A1L3MBTL1POLBGAATSHR
SCHEMBL26063431 0.87 ALDH1A1 (0.40) ALDH1A1MEN1KMT2AL3MBTL1HPGD
SCHEMBL15216349 0.86 CYP4F2 (0.33) ALDH1A1MEN1KMT2AL3MBTL1MAPT
SCHEMBL15216329 0.85 ALDH1A1 (0.41) ALDH1A1MEN1KMT2AL3MBTL1HPGD
SCHEMBL18785967 0.84 POLB (0.43) ALDH1A1CYP2C19MAPTPOLBTSHR
SCHEMBL18786007 0.83 MLYCD (0.36) ALDH1A1MEN1KMT2AL3MBTL1HPGD
SCHEMBL15216343 0.82 L3MBTL1 (0.33) ALDH1A1L3MBTL1MAPTGAATSHR
SCHEMBL974742 0.82 KMT2A (0.39) ALDH1A1MEN1KMT2ACYP2C19MAPT
SCHEMBL18775771 0.81 ALDH1A1 (0.40) ALDH1A1MEN1KMT2AL3MBTL1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11579529-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-02-14 US disclosed
US-20200285152-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-09-10 US disclosed
US-20170115566-A1 RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-27 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170115566-A1 RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS CASR, LIFR, LBR ALDH1A1 4520/4885MEN1 2638/4885KMT2A 2108/4885
US-20200285152-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS POLR1C, EWSR1, LBR ALDH1A1 4408/4885MEN1 4698/4885KMT2A 4345/4885
US-11579529-B2 Positive resist composition and patterning process POLR1C, EWSR1, LBR ALDH1A1 4408/4885MEN1 4698/4885KMT2A 4345/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.