SCHEMBL15216342

SCHEMBL15216342

CCCC(=O)OCCN(CCC)c1ccc(C(=O)OC(C(F)(F)F)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.32

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.32
EGFR P00533 1/20 0.32
ERBB2 P04626 1/20 0.32
LMNA P02545 4/20 0.31
MAPT P10636 4/20 0.31
SCN1A P35498 2/20 0.31
SCN2A Q99250 2/20 0.31
SCN3A Q9NY46 2/20 0.31
TSHR P16473 2/20 0.31
MAOA P21397 2/20 0.31
HRH3 Q9Y5N1 2/20 0.31
TDP1 Q9NUW8 1/20 0.31
CYP1A2 P05177 1/20 0.31
CNR1 P21554 1/20 0.31
DRD4 P21917 1/20 0.31
ACHE P22303 1/20 0.31
HRH2 P25021 1/20 0.31
HTR2A P28223 1/20 0.31
HTR2C P28335 1/20 0.31
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15216343 0.98 L3MBTL1 (0.33) L3MBTL1EGFRERBB2LMNAMAPT
SCHEMBL15216337 0.90 EGFR (0.39) L3MBTL1EGFRERBB2LMNAMAPT
SCHEMBL15216346 0.86 HPGD (0.32) LMNAMAPTSCN1ASCN2ASCN3A
SCHEMBL15216330 0.84 L3MBTL1 (0.36) L3MBTL1EGFRERBB2LMNAMAPT
SCHEMBL15216338 0.83 EGFR (0.41) L3MBTL1EGFRERBB2LMNASCN1A
SCHEMBL15216327 0.83 L3MBTL1 (0.37) L3MBTL1LMNAMAPTSCN1ASCN2A
SCHEMBL15216348 0.81 ALDH1A1 (0.40) L3MBTL1MAPTTSHRMAPK1ALDH1A1
SCHEMBL15216349 0.80 CYP4F2 (0.33) L3MBTL1LMNAMAPTTSHRALDH1A1
SCHEMBL26063433 0.79 EGFR (0.39) L3MBTL1EGFRERBB2MAPTTSHR
SCHEMBL15216336 0.78 ALDH1A1 (0.35) LMNAMAPTTSHRMAPK1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11579529-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-02-14 US disclosed
US-20200285152-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-09-10 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200285152-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS POLR1C, EWSR1, LBR L3MBTL1 3462/4885EGFR 174/4885ERBB2 1189/4885
US-11579529-B2 Positive resist composition and patterning process POLR1C, EWSR1, LBR L3MBTL1 3462/4885EGFR 174/4885ERBB2 1189/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.