SCHEMBL15216346

SCHEMBL15216346

COCC(=O)OCCN(CCOC(=O)COC)c1ccc(C(=O)OC(C(F)(F)F)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.32

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.32
CA2 P00918 1/20 0.31
RAB9A P51151 1/20 0.31
MAPT P10636 2/20 0.30
LMNA P02545 1/20 0.30
SCN1A P35498 1/20 0.30
SCN2A Q99250 1/20 0.30
SCN3A Q9NY46 1/20 0.30
ALDH1A1 P00352 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
MGLL Q99685 1/20 0.30
ABHD6 Q9BV23 1/20 0.30
PHLPP2 Q6ZVD8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15216343 0.88 L3MBTL1 (0.33) RAB9AMAPTLMNASCN1ASCN2A
SCHEMBL15216342 0.86 L3MBTL1 (0.32) RAB9AMAPTLMNASCN1ASCN2A
SCHEMBL15216337 0.82 EGFR (0.39) CA2RAB9AMAPTLMNAALDH1A1
SCHEMBL15216349 0.81 CYP4F2 (0.33) MAPTLMNAALDH1A1
SCHEMBL15216338 0.81 EGFR (0.41) LMNASCN1ASCN2ASCN3AALDH1A1
SCHEMBL15216348 0.80 ALDH1A1 (0.40) HPGDRAB9AMAPTALDH1A1SMN1; SMN2
SCHEMBL15216336 0.79 ALDH1A1 (0.35) HPGDRAB9AMAPTLMNAALDH1A1
SCHEMBL15216339 0.78 ALDH1A1 (0.37) MAPTLMNAALDH1A1
SCHEMBL15216329 0.76 ALDH1A1 (0.41) HPGDCA2RAB9AMAPTLMNA
SCHEMBL18785967 0.72 POLB (0.43) CA2RAB9AMAPTLMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11579529-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-02-14 US disclosed
US-20200285152-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-09-10 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200285152-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS POLR1C, EWSR1, LBR HPGD 4625/4885CA2 3185/4885RAB9A 2085/4885
US-11579529-B2 Positive resist composition and patterning process POLR1C, EWSR1, LBR HPGD 4625/4885CA2 3185/4885RAB9A 2085/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.