SCHEMBL15216339

SCHEMBL15216339

O=C(OC(C(F)(F)F)C(F)(F)S(=O)(=O)O)c1ccc(N(CCOC(=O)C23CC4CC(CC(C4)C2)C3)CCOC(=O)C23CC4CC(CC(C4)C2)C3)cc1

nearest known ligand 0.39

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.37
LMNA P02545 1/20 0.37
HSP90AA1 P07900 1/20 0.36
KMT2A Q03164 1/20 0.36
NPSR1 Q6W5P4 3/20 0.35
MAPT P10636 1/20 0.35
CYP17A1 P05093 2/20 0.34
CYP19A1 P11511 2/20 0.34
GAA P10253 1/20 0.34
PRKCA P17252 1/20 0.33
GABBR2 O75899 1/20 0.31
GABBR1 Q9UBS5 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15216344 0.84 HSP90AA1 (0.40) ALDH1A1LMNAHSP90AA1KMT2ANPSR1
SCHEMBL15216336 0.79 ALDH1A1 (0.35) ALDH1A1LMNAKMT2ANPSR1MAPT
SCHEMBL15216346 0.78 HPGD (0.32) ALDH1A1LMNAMAPT
SCHEMBL1656566 0.78 MEN1 (0.38) ALDH1A1LMNAHSP90AA1KMT2ACYP17A1
SCHEMBL15216343 0.78 L3MBTL1 (0.33) ALDH1A1LMNANPSR1MAPTGAA
SCHEMBL15216349 0.78 CYP4F2 (0.33) ALDH1A1LMNAKMT2AMAPT
SCHEMBL15216337 0.77 EGFR (0.39) ALDH1A1LMNANPSR1MAPT
SCHEMBL15216342 0.76 L3MBTL1 (0.32) ALDH1A1LMNAMAPTGAA
SCHEMBL12912791 0.76 PRKCA (0.40) ALDH1A1KMT2ANPSR1MAPTCYP17A1
SCHEMBL15216338 0.75 EGFR (0.41) ALDH1A1LMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed