SCHEMBL15224311

SCHEMBL15224311

O=S(=O)(OS(c1ccccc1)(c1ccccc1)c1ccccc1)C(F)C(O)(F)C(F)(F)F

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR1H3 Q13133 8/20 0.40
HSD11B1 P28845 3/20 0.40
TSHR P16473 2/20 0.39
POLB P06746 2/20 0.39
MAPK1 P28482 1/20 0.39
NR1H2 P55055 7/20 0.38
ABCC9 O60706 1/20 0.38
ABCC8 Q09428 1/20 0.38
KCNJ11 Q14654 1/20 0.38
KCNJ8 Q15842 1/20 0.38
MEN1 O00255 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C19 P33261 1/20 0.38
KMT2A Q03164 1/20 0.38
NR1I2 O75469 3/20 0.36
RORC P51449 3/20 0.36
RORA P35398 2/20 0.36
RORB Q92753 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5872606 0.85 HSD11B1 (0.36) NR1H3HSD11B1TSHRNR1H2NR1I2
SCHEMBL37033 0.71 HTR6 (0.42) NR1H3HSD11B1TSHRNR1H2ALDH1A1
SCHEMBL962839 0.70 HSD11B1 (0.41) NR1H3HSD11B1TSHRNR1H2ABCC9
SCHEMBL3791469 0.69 HSD11B1 (0.41) NR1H3HSD11B1TSHRNR1H2ABCC9
SCHEMBL7708209 0.69 HSD11B1 (0.34) NR1H3HSD11B1TSHRNR1H2MEN1
SCHEMBL1634800 0.68 HSD11B1 (0.39) NR1H3HSD11B1TSHRPOLBMAPK1
SCHEMBL965951 0.68 CA1 (0.39) NR1H3HSD11B1TSHRNR1H2ABCC9
SCHEMBL2391334 0.68 HSD11B1 (0.34) NR1H3HSD11B1TSHRNR1H2ABCC9
SCHEMBL482039 0.68 HSD11B1 (0.36) NR1H3HSD11B1TSHRPOLBMAPK1
SCHEMBL2437767 0.67 HTR6 (0.38) NR1H3HSD11B1TSHRNR1H2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2634631-A1 Acid generator, chemically amplified resist composition, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2013-09-04 EP disclosed