SCHEMBL7708209

SCHEMBL7708209

O=S(=O)(OS(c1ccccc1)(c1ccccc1)c1ccccc1)C(F)(F)C(F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 3/20 0.34
ALDH1A1 P00352 5/20 0.33
LMNA P02545 1/20 0.33
MAPT P10636 1/20 0.33
HTT P42858 1/20 0.33
HTR6 P50406 1/20 0.33
APOBEC3G Q9HC16 1/20 0.32
NR1H3 Q13133 3/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
HSD17B10 Q99714 2/20 0.31
TSHR P16473 2/20 0.31
TDP1 Q9NUW8 2/20 0.31
CA1 P00915 2/20 0.31
CA2 P00918 2/20 0.31
CA5A P35218 2/20 0.31
CA9 Q16790 2/20 0.31
CA12 O43570 1/20 0.31
CA3 P07451 1/20 0.31
CA4 P22748 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL482039 0.82 HSD11B1 (0.36) HSD11B1ALDH1A1HTR6APOBEC3GNR1H3
SCHEMBL7708228 0.81 ALDH1A1 (0.41) HSD11B1ALDH1A1LMNAMAPTMEN1
SCHEMBL37033 0.80 HTR6 (0.42) HSD11B1ALDH1A1LMNAMAPTHTT
SCHEMBL2391334 0.78 HSD11B1 (0.34) HSD11B1NR1H3MEN1KMT2ATSHR
SCHEMBL1484104 0.77 RORC (0.35) HSD11B1ALDH1A1MAPTHTTAPOBEC3G
SCHEMBL1002572 0.76 PKM (0.38) HSD11B1ALDH1A1MAPTKMT2ASMN1; SMN2
SCHEMBL5872606 0.76 HSD11B1 (0.36) HSD11B1ALDH1A1LMNAMAPTHTT
SCHEMBL4366558 0.75 CA1 (0.32) CA1CA2CA9
SCHEMBL2437767 0.75 HTR6 (0.38) HSD11B1ALDH1A1LMNAMAPTHTT
SCHEMBL962839 0.75 HSD11B1 (0.41) HSD11B1ALDH1A1HTR6APOBEC3GNR1H3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1099983-B1 Chemically amplified positive resist composition and patterning method SHINETSU CHEMICAL CO (JP) 2014-08-06 EP claimed
EP-1099983-B1 Chemically amplified positive resist composition and patterning method SHINETSU CHEMICAL CO (JP) 2014-08-06 EP disclosed
US-6358665-B1 ONIUM SALT PRECURSOR FOR GENERATING FLUOROALKYLSULFONATE CLARIANT INTERNATIONAL LTD. (CH) 2002-03-19 US disclosed
EP-1033624-A1 RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE Clariant International Ltd. (CH) 2000-09-06 EP disclosed