⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL3364319 | 0.86 | KCNH2 (0.35) | — | |
| SCHEMBL1533147 | 0.85 | GAA (0.30) | — | |
| SCHEMBL6239896 | 0.84 | GAA (0.30) | — | |
| SCHEMBL6398679 | 0.79 | KDM4E (0.34) | — | |
| SCHEMBL2130956 | 0.77 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL3366125 | 0.77 | HPGD (0.32) | — | |
| SCHEMBL29429148 | 0.77 | SLC2A1 (0.36) | — | |
| SCHEMBL447052 | 0.77 | SLC2A1 (0.36) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL3365764 | 0.77 | CNR1 (0.32) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL2745921 | 0.77 | ACHE (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9200098-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9128370-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-09-08 | — | — | US | disclosed |
| US-9023584-B2 | Radiation-sensitive composition, and compound | JSR CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20130280658-A1 | RADIATION-SENSITIVE COMPOSITION, AND COMPOUND | JSR CORPORATION (JP) | 2013-10-24 | — | — | US | disclosed |
| US-20130149644-A1 | RADIATION-SENSITIVE COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2013-06-13 | — | — | US | disclosed |
| US-20120164582-A1 | RADIATION-SENSITIVE COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2012-06-28 | — | — | US | disclosed |
| US-8026039-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2011-09-27 | — | — | US | disclosed |
| US-20110143279-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2011-06-16 | — | — | US | disclosed |
| US-7897821-B2 | Sulfonium compound | JSR CORPORATION (JP) | 2011-03-01 | — | — | US | disclosed |
| US-20100324329-A1 | COMPOUND | JSR CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| US-7812105-B2 | Compound, polymer, and radiation-sensitive composition | JSR CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-20100040977-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| EP-2088467-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2009-08-12 | — | — | EP | disclosed |
| US-20090069521-A1 | Novel Compound, Polymer, and Radiation-Sensitive Composition | JSR CORPORATION (JP) | 2009-03-12 | — | — | US | disclosed |
| EP-1897869-A1 | NOVEL COMPOUND, POLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-03-12 | — | — | EP | disclosed |