Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC2A1 | P11166 | 2/20 | 0.36 |
| ▸ | CNR1 | P21554 | 3/20 | 0.33 |
| ▸ | CNR2 | P34972 | 3/20 | 0.33 |
| ▸ | FABP4 | P15090 | 8/20 | 0.32 |
| ▸ | FABP5 | Q01469 | 8/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | BCHE | P06276 | 1/20 | 0.31 |
| ▸ | ACHE | P22303 | 1/20 | 0.31 |
| ▸ | FABP3 | P05413 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL447052 | 1.00 | SLC2A1 (0.36) | SLC2A1CNR1CNR2FABP4FABP5 | |
| SCHEMBL5866201 | 0.92 | ALDH1A1 (0.39) | FABP4MEN1KMT2AALDH1A1LMNA | |
| SCHEMBL5866195 | 0.88 | ALDH1A1 (0.34) | MEN1KMT2AALDH1A1LMNAHTT | |
| SCHEMBL2542340 | 0.87 | SLC2A1 (0.33) | SLC2A1CNR1CNR2MEN1KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL36280 | 0.83 | SLC2A1 (0.42) | SLC2A1CNR1CNR2FABP4FABP5 | |
| Trifluoromethanesulfonic Acid SCHEMBL29354733 | 0.83 | SLC2A1 (0.42) | SLC2A1CNR1CNR2FABP4FABP5 | |
| SCHEMBL190939 | 0.82 | SLC2A1 (0.38) | SLC2A1CNR1CNR2FABP4FABP5 | |
| SCHEMBL29754149 | 0.82 | SLC2A1 (0.38) | SLC2A1CNR1CNR2FABP4FABP5 | |
| SCHEMBL3872282 | 0.82 | CNR2 (0.30) | CNR2 | |
| SCHEMBL448402 | 0.81 | SLC2A1 (0.37) | SLC2A1CNR1CNR2FABP4FABP5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4516394-A2 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10x Genomics, Inc. (US) | 2025-03-05 | — | — | EP | disclosed |
| EP-4405094-A1 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10X Genomics, Inc. (US) | 2024-07-31 | — | — | EP | disclosed |
| WO-2024006799-A1 | COVALENT ATTACHMENT OF SPLINT OLIGONUCLEOTIDES FOR MOLECULAR ARRAY GENERATION USING LIGATION | 10X GENOMICS, INC. (US) | 2024-01-04 | — | — | WO | disclosed |
| WO-2024006798-A1 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10X GENOMICS, INC. (US) | 2024-01-04 | — | — | WO | disclosed |
| WO-2024006827-A1 | METHODS AND SYSTEMS FOR LIGHT-CONTROLLED SURFACE PATTERNING USING PHOTOMASKS | 10X GENOMICS, INC. (US) | 2024-01-04 | — | — | WO | disclosed |
| EP-4271511-A1 | MOLECULAR ARRAY GENERATION USING PHOTORESIST | 10X Genomics, Inc. (US) | 2023-11-08 | — | — | EP | disclosed |
| EP-4058848-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | Merck Patent GmbH (DE) | 2022-09-21 | — | — | EP | disclosed |
| WO-2022147140-A1 | MOLECULAR ARRAY GENERATION USING PHOTORESIST | 10X GENOMICS, INC. (US) | 2022-07-07 | — | — | WO | disclosed |
| WO-2022138331-A1 | FILM FORMATION METHOD AND ARTICLE MANUFACTURING METHOD | キヤノン株式会社 | 2022-06-30 | — | — | WO | disclosed |
| WO-2022091731-A1 | METAL COMPLEX, COMPOSITION, RESIST MATERIAL, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | DIC株式会社 | 2022-05-05 | — | — | WO | disclosed |
| WO-2022065374-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING FLUOROALKYL GROUP-CONTAINING ORGANIC ACID OR SALT THEREOF | 日産化学株式会社 | 2022-03-31 | — | — | WO | disclosed |