Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 5/20 | 0.39 |
| ▸ | CA1 | P00915 | 4/20 | 0.39 |
| ▸ | MMP1 | P03956 | 2/20 | 0.39 |
| ▸ | MMP2 | P08253 | 2/20 | 0.39 |
| ▸ | MMP9 | P14780 | 2/20 | 0.39 |
| ▸ | MMP8 | P22894 | 2/20 | 0.39 |
| ▸ | MMP13 | P45452 | 2/20 | 0.39 |
| ▸ | F2 | P00734 | 3/20 | 0.36 |
| ▸ | PRSS1 | P07477 | 3/20 | 0.36 |
| ▸ | PRSS2 | P07478 | 3/20 | 0.36 |
| ▸ | PRSS3 | P35030 | 3/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1533097 | 0.98 | CA2 (0.37) | CA2CA1MMP1MMP2MMP9 | |
| Trifluoromethanesulfonic Acid SCHEMBL64813 | 0.79 | ALDH1A1 (0.31) | — | |
| SCHEMBL3137331 | 0.79 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL615754 | 0.79 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3135152 | 0.79 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3139152 | 0.79 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL24140 | 0.79 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3137344 | 0.79 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL332726 | 0.79 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL8437168 | 0.79 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11906900-B2 | Chemically amplified positive photoresist composition for improving pattern profile | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2024-02-20 | — | — | US | claimed |
| US-11586109-B2 | Chemically-amplified-type negative-type photoresist composition | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-02-21 | — | — | US | claimed |
| CN-109154776-B | Chemically amplified negative photoresist composition | 荣昌化学制品株式会社 | 2022-06-28 | — | — | CN | claimed |
| EP-3435160-B1 | NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER, HAVING HIGH RESOLUTION AND HIGH ASPECT RATIO | YOUNG CHANG CHEMICAL CO LTD (KR) | 2022-05-04 | — | — | EP | claimed |
| CN-109073973-B | Negative photoresist composition for KrF laser with high resolution and high aspect ratio | 荣昌化学制品株式会社 | 2021-09-28 | — | — | CN | claimed |
| US-20210216013-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2021-07-15 | — | — | US | claimed |
| CN-107850841-B | Negative photoresist composition for KrF laser for forming semiconductor pattern | 荣昌化学制品株式会社 | 2021-04-02 | — | — | CN | claimed |
| US-10775699-B2 | Negative photoresist composition for KRF laser, having high resolution and high aspect ratio | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2020-09-15 | — | — | US | claimed |
| US-20190137871-A1 | CHEMICALLY-AMPLIFIED-TYPE NEGATIVE-TYPE PHOTORESIST COMPOSITION | YCCHEM CO., LTD. (KR) | 2019-05-09 | — | — | US | claimed |
| US-20190101827-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER, HAVING HIGH RESOLUTION AND HIGH ASPECT RATIO | YCCHEM CO., LTD. (KR) | 2019-04-04 | — | — | US | claimed |
| EP-3435160-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER, HAVING HIGH RESOLUTION AND HIGH ASPECT RATIO | Young Chang Chemical Co., Ltd. (KR) | 2019-01-30 | — | — | EP | claimed |
| US-10162261-B2 | Negative photoresist composition for KrF laser for forming semiconductor patterns | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2018-12-25 | — | — | US | claimed |
| US-20180203351-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER FOR FORMING SEMICONDUCTOR PATTERNS | YCCHEM CO., LTD. (KR) | 2018-07-19 | — | — | US | claimed |
| US-6800418-B2 | ALLOWING DEVELOPMENT WITH CONVENTIONAL DEVELOPERS AND HAVING A HIGH TRANSMITTANCE AT A F2 EXCIMER LASER WAVELENGTH OF 157 NM, HYDROPHILICITY, ADHESION TO UNDERLAYER | SAMSUNG ELECTRONICS (KR) | 2004-10-05 | — | — | US | claimed |
| US-20030157430-A1 | Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-08-21 | — | — | US | claimed |
| US-12503433-B2 | Acetal-based compound, acetal-based prepolymer, acetal-based polymer, and photoresist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-12-23 | — | — | US | disclosed |
| US-11906900-B2 | Chemically amplified positive photoresist composition for improving pattern profile | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2024-02-20 | — | — | US | disclosed |
| US-6482568-B1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-11-19 | — | — | US | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-1078945-A2 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2001-02-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12503433-B2 | Acetal-based compound, acetal-based prepolymer, acetal-based polymer, and photoresist composition comprising the same | PARP10, ADCY10, APRT | CA2 3753/4885CA1 1485/4885MMP1 4141/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.