Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL4450384 | 0.83 | CA5A (0.35) | — | |
| SCHEMBL1533097 | 0.81 | CA2 (0.37) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL542504 | 0.80 | ALDH1A1 (0.30) | ALDH1A1L3MBTL1 | |
| SCHEMBL1533057 | 0.79 | CA2 (0.39) | — | |
| SCHEMBL64827 | 0.78 | PARL (0.31) | — | |
| SCHEMBL1123 | 0.77 | — | — | |
| SCHEMBL785147 | 0.77 | — | — | |
| SCHEMBL28950377 | 0.74 | PARL (0.31) | — | |
| SCHEMBL64832 | 0.74 | KMT2A (0.30) | — | |
| Trifluoroacetic Acid SCHEMBL504170 | 0.74 | CA12 (0.32) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250377591-A1 | PHOTORESIST COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-12-11 | — | — | US | claimed |
| US-20240294771-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | Tan Kah Kee Innovation Laboratory (CN) | 2024-09-05 | — | — | US | claimed |
| CN-110832397-B | Composition for forming resist underlayer film, and method for forming resist pattern | 日产化学株式会社 | 2023-12-15 | — | — | CN | claimed |
| CN-113913075-B | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-09-20 | — | — | CN | claimed |
| CN-111880371-B | Photoresist and method for patterning imine material | 常州华睿芯材科技有限公司 | 2022-05-03 | — | — | CN | claimed |
| CN-113913075-A | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-01-11 | — | — | CN | claimed |
| CN-111880371-A | Photoresist and method for patterning imine material | 清华大学 | 2020-11-03 | — | — | CN | claimed |
| US-10345701-B2 | Photoresist polymers, photoresist compositions, methods of forming patterns and methods of manufacturing semiconductor devices | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2019-07-09 | — | — | US | claimed |
| US-7670748-B2 | Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-03-02 | — | — | US | claimed |
| US-7494761-B2 | Cyclodextrin derivative, photoresist composition including the cyclodextrin derivative and method of forming a pattern using the photoresist composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-02-24 | — | — | US | claimed |
| US-20030157430-A1 | Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-08-21 | — | — | US | claimed |
| US-6537727-B2 | Improved dry etching resistance, adhesiveness to underlying material layers, line edge roughness of line patterns, contrast characteristics | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-03-25 | — | — | US | claimed |
| US-6497987-B1 | MIXTURES OF POLYETHERS, ACID GENERATORS AND AMINES THAT MAINTAIN TRANSPARENCY WHEN EXPOSED TO SHORT-WAVELENGTH LIGHT AND HAVE IMPROVED ADHESION TO FILMS, SOLUBILITY TO DEVELOPERS AND ETCH SELECTIVITY; PHOTOLITHOGRAPHY | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-12-24 | — | — | US | claimed |
| US-20020177067-A1 | Fluoro-containing photosensitive polymer and photoresist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. | 2002-11-28 | — | — | US | claimed |
| US-20020160303-A1 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-31 | — | — | US | claimed |
| US-20020155379-A1 | Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-24 | — | — | US | claimed |
| US-20020146642-A1 | Photosensitive polymers and resist compositions comprising the photosensitive polymers | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-10 | — | — | US | claimed |
| US-20020042016-A1 | Resist composition comprising photosensitive polymer having loctone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-04-11 | — | — | US | claimed |
| US-20010024763-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-27 | — | — | US | claimed |
| US-5621019-A | PHOTORESIST CONTAINING PHOTO ACID GENERATOR AND ULTRAVIOLET RADIATION TRANSPARENT ACRYLIC POLYMER HAVING BRIDGED CYCLOHYDROCARBON GROUP RESIDUE; RESOLUTION, DRY ETCH RESISTANCE | NEC CORPORATION (JP) | 1997-04-15 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020160303-A1 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | PAH, SUV39H1, SUV39H2 | ALDH1A1 2217/4885L3MBTL1 3247/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.