Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 4/20 | 0.37 |
| ▸ | CA1 | P00915 | 3/20 | 0.37 |
| ▸ | MMP1 | P03956 | 3/20 | 0.37 |
| ▸ | MMP2 | P08253 | 3/20 | 0.37 |
| ▸ | MMP9 | P14780 | 3/20 | 0.37 |
| ▸ | MMP8 | P22894 | 3/20 | 0.37 |
| ▸ | MMP13 | P45452 | 3/20 | 0.37 |
| ▸ | F2 | P00734 | 3/20 | 0.34 |
| ▸ | PRSS1 | P07477 | 3/20 | 0.34 |
| ▸ | PRSS2 | P07478 | 3/20 | 0.34 |
| ▸ | PRSS3 | P35030 | 3/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1533057 | 0.98 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| Trifluoromethanesulfonic Acid SCHEMBL64813 | 0.81 | ALDH1A1 (0.31) | — | |
| SCHEMBL30354089 | 0.78 | CA2 (0.54) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL23932 | 0.78 | CA2 (0.54) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL24140 | 0.76 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL6916713 | 0.76 | CA2 (0.52) | CA2CA1MMP1MMP2MMP9 | |
| Fluoride SCHEMBL1995965 | 0.76 | CA2 (0.52) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL6912911 | 0.76 | CA2 (0.52) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL21802716 | 0.76 | CA2 (0.52) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL5960730 | 0.76 | CA2 (0.52) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250244664-A1 | PHOTORESIST COMPOSITIONS AND PATTERNING METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2025-07-31 | — | — | US | claimed |
| US-20250102910-A1 | PHOTORESIST COMPOSITION AND METALLIZATION METHOD | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2025-03-27 | — | — | US | claimed |
| CN-119322427-A | Photoresist composition and metallization method | 杜邦电子材料国际有限责任公司 | 2025-01-17 | — | — | CN | claimed |
| CN-109154776-B | Chemically amplified negative photoresist composition | 荣昌化学制品株式会社 | 2022-06-28 | — | — | CN | claimed |
| CN-108267933-B | Radiation-sensitive composition and patterning and metallization process | 罗门哈斯电子材料有限责任公司 | 2021-12-03 | — | — | CN | claimed |
| US-10962880-B2 | Radiation-sensitive compositions and patterning and metallization processes | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2021-03-30 | — | — | US | claimed |
| US-20200201175-A1 | RADIATION-SENSITIVE COMPOSITIONS AND PATTERNING AND METALLIZATION PROCESSES | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2020-06-25 | — | — | US | claimed |
| US-20180188648-A1 | RADIATION-SENSITIVE COMPOSITIONS AND PATTERNING AND METALLIZATION PROCESSES | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-07-05 | — | — | US | claimed |
| EP-3343293-A1 | RADIATION-SENSITIVE COMPOSITIONS AND PATTERNING AND METALLIZATION PROCESSES | Rohm and Haas Electronic Materials LLC (US) | 2018-07-04 | — | — | EP | claimed |
| US-12512430-B2 | Metallization method | DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC (US) | 2025-12-30 | — | — | US | disclosed |
| US-20250244664-A1 | PHOTORESIST COMPOSITIONS AND PATTERNING METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2025-07-31 | — | — | US | disclosed |
| US-20250102910-A1 | PHOTORESIST COMPOSITION AND METALLIZATION METHOD | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2025-03-27 | — | — | US | disclosed |
| CN-119644670-A | Photoresist composition and method of forming pattern using the same | 三星电子株式会社 | 2025-03-18 | — | — | CN | disclosed |
| CN-119322427-A | Photoresist composition and metallization method | 杜邦电子材料国际有限责任公司 | 2025-01-17 | — | — | CN | disclosed |
| EP-1085379-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-01-04 | — | — | EP | disclosed |
| US-6800419-B2 | FOR USE AS CHEMICALLY-AMPLIFIED RESIST FOR MICROFABRICATION UTILIZING DEEP ULTRAVIOLET RAYS AND EXHIBITS EXCELLENT FILM THICKNESS UNIFORMITY AND STORAGE STABILITY | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-20040072094-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2004-04-15 | — | — | US | disclosed |
| US-20030203307-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |
| US-6482568-B1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-11-19 | — | — | US | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12512430-B2 | Metallization method | CUTA, AS3MT, METTL14 | CA2 3314/4885CA1 1918/4885MMP1 1997/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.