SCHEMBL15344308

SCHEMBL15344308

CC(C)(C)Oc1cc(S)cc(OC(C)(C)C)c1

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ KIF11 P52732 1/20 0.33
▸ RIPK1 Q13546 1/20 0.31
▸ ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3818720 0.86 ALDH1A1 (0.39) KIF11RIPK1ALDH1A1
SCHEMBL21016727 0.84 — —
SCHEMBL19260035 0.81 — —
SCHEMBL18925848 0.78 KIF11 (0.35) KIF11RIPK1ALDH1A1
SCHEMBL2092201 0.77 KIF11 (0.41) KIF11RIPK1ALDH1A1
SCHEMBL29993108 0.77 KIF11 (0.41) KIF11RIPK1ALDH1A1
SCHEMBL9789782 0.76 GABRA1 (0.42) KIF11ALDH1A1
SCHEMBL14075676 0.76 ALDH1A1 (0.61) ALDH1A1
SCHEMBL15341308 0.76 ALDH1A1 (0.37) KIF11RIPK1ALDH1A1
SCHEMBL2091562 0.74 GPR3 (0.39) KIF11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130280912-A1 SILICON COMPOUND, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING THE SAME AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-10-24 — — US disclosed
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