SCHEMBL2092201

SCHEMBL2092201

CC(C)(C)Oc1cccc(S)c1

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ KIF11 P52732 1/20 0.41
▸ ALDH1A1 P00352 2/20 0.33
▸ KDM4E B2RXH2 1/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ HPGD P15428 1/20 0.33
▸ KMT2A Q03164 1/20 0.33
▸ NPSR1 Q6W5P4 1/20 0.33
▸ CETP P11597 1/20 0.32
▸ ACHE P22303 1/20 0.31
▸ RIPK1 Q13546 1/20 0.31
▸ PRKDC P78527 1/20 0.31
▸ CYP3A4 P08684 2/20 0.31
▸ PPARG P37231 1/20 0.30
▸ PPARA Q07869 1/20 0.30
▸ TRPV1 Q8NER1 1/20 0.30
▸ CA1 P00915 1/20 0.30
▸ CA2 P00918 1/20 0.30
▸ CA7 P43166 1/20 0.30
▸ CA9 Q16790 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29993108 1.00 KIF11 (0.41) KIF11ALDH1A1KDM4EMEN1HPGD
Biphenyl SCHEMBL27553552 0.85 CETP (0.36) KIF11ALDH1A1KDM4EMEN1HPGD
SCHEMBL260934 0.84 KIF11 (0.47) KIF11ALDH1A1KDM4EMEN1HPGD
SCHEMBL159683 0.78 GPR3 (0.42) KIF11ALDH1A1HPGDCETP
SCHEMBL11229284 0.78 KIF11 (0.41) KIF11ALDH1A1KDM4EMEN1HPGD
SCHEMBL2092198 0.77 KIF11 (0.43) KIF11ALDH1A1KDM4EMEN1HPGD
Hydrochloric Acid SCHEMBL27878364 0.77 KIF11 (0.40) KIF11ALDH1A1KDM4EMEN1HPGD
SCHEMBL15344308 0.77 KIF11 (0.33) KIF11ALDH1A1RIPK1
SCHEMBL678558 0.76 ACHE (0.52) ALDH1A1KDM4EMEN1HPGDKMT2A
SCHEMBL1802320 0.76 CYP3A4 (0.53) KIF11ALDH1A1ACHECYP3A4CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101034260-B Photosensitive resin composition DONGJIN SEMICOHEM CO LTD 2012-07-18 — — CN claimed
CN-101034260-A Photosensitive resin composition DONGJIN SEMICHEM CO LTD (KR) 2007-09-12 — — CN claimed
EP-3214497-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING THE SAME, PATTERNING PROCESS, AND LAMINATE Shin-Etsu Chemical Co., Ltd. (JP) 2017-09-06 — — EP disclosed
CN-106444288-A Chemically amplified positive resist composition and pattern forming process 信越化学工业株式会社 2017-02-22 — — CN disclosed
CN-103781813-B The epoxy resin adduct mixed 蓝立方知识产权有限责任公司 2016-09-14 — — CN disclosed
CN-105676601-A Pretreatment method of glass substrate used for forming etching mask 东京应化工业株式会社 2016-06-15 — — CN disclosed
CN-103228694-B Heat curable composition and the thermosetting material prepared by heat curable composition Blue Cube Intellectual Property Co.,Ltd. (US) 2016-04-27 — — CN disclosed
CN-105404096-A CHEMICALLY AMPLIFIED POSITIVE RESIST DRY FILM, DRY FILM LAMINATE AND METHOD OF PREPARING LAMINATE SHINETSU CHEMICAL CO 2016-03-16 — — CN disclosed
CN-103163730-B Chemical amplification type photoetching compositions is utilized to carry out the method for minor groove patterning TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (CN) 2016-03-09 — — CN disclosed
CN-105301905-A Chemically amplified positive resist composition and patterning process SHINETSU CHEMICAL CO 2016-02-03 — — CN disclosed
CN-105283432-A Composition comprising a compound containing a vinyl group TOKYO OHKA KOGYO CO LTD 2016-01-27 — — CN disclosed
EP-1678185-B1 2,3-DIHYDRO-6-NITROIMIDAZO [2,1-B] OXAZOLE COMPOUNDS FOR THE TREATMENT OF TUBERCULOSIS OTSUKA PHARMA CO LTD (JP) 2008-10-08 — — EP disclosed
US-20080119478-A1 2,3-Dihydro-6-Nitroimidazo (2,1-b) Oxazole Compounds for the Treatment of Tuberculosis OTSUKA PHAMACEUTICAL CO., LTD. (JP) 2008-05-22 — — US disclosed
CN-101034260-A Photosensitive resin composition DONGJIN SEMICHEM CO LTD (KR) 2007-09-12 — — CN disclosed
CN-1983031-A Photosensitive resin composition for organic light emitting diodes DONGJIN SEMICHEM CO LTD (KR) 2007-06-20 — — CN disclosed
EP-1678185-A1 2,3-DIHYDRO-6-NITROIMIDAZO [2,1-B] OXAZOLE COMPOUNDS FOR THE TREATMENT OF TUBERCULOSIS OTSUKA PHARMACEUTICAL CO., LTD. (JP) 2006-07-12 — — EP disclosed
WO-2005042542-A1 2,3-DIHYDRO-6-NITROIMIDAZO (2,1-B) OXAZOLE COMPOUNDS FOR THE TREATMENT OF TUBERCULOSIS OTSUKA PHARMACEUTICAL CO., LTD. (JP) 2005-05-12 — — WO disclosed
CN-1607461-A Resist polymer, resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2005-04-20 — — CN disclosed
CN-1578794-A Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity DUPONT ELECTRONIC TECHNOLOGIES (US) 2005-02-09 — — CN disclosed
CN-1550896-A Processes for preparing photoresist compositions and the product ��Ļ���Ű˾ 2004-12-01 — — CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080119478-A1 2,3-Dihydro-6-Nitroimidazo (2,1-b) Oxazole Compounds for the Treatment of Tuberculosis NR2C2, NR0B2, NR4A2 KIF11 3992/4885ALDH1A1 412/4885KDM4E 4578/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

Send feedback