Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | GPX4 | P36969 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15470586 | 0.81 | ALOX15 (0.30) | — | |
| SCHEMBL15470585 | 0.79 | KMT2A (0.33) | LMNAGPX4 | |
| SCHEMBL15470572 | 0.77 | GPX4 (0.30) | GPX4 | |
| SCHEMBL15470583 | 0.76 | — | — | |
| SCHEMBL15470566 | 0.75 | ALDH1A1 (0.30) | ALDH1A1 | |
| SCHEMBL15470563 | 0.70 | LMNA (0.32) | ALDH1A1LMNA | |
| SCHEMBL15470569 | 0.69 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL15470548 | 0.69 | LMNA (0.38) | ALDH1A1LMNA | |
| SCHEMBL15470568 | 0.68 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL15470570 | 0.68 | ALDH1A1 (0.35) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9075308-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | disclosed |
| US-9075308-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | disclosed |
| US-20140045122-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-13 | — | — | US | disclosed |
| US-20140045122-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-13 | — | — | US | disclosed |