Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Clorazepic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.67 |
| ▸ | MEN1 | O00255 | 1/20 | 0.67 |
| ▸ | ALB | P02768 | 1/20 | 0.67 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.67 |
| ▸ | CHRM1 | P11229 | 6/20 | 0.60 |
| ▸ | CCKBR | P32239 | 4/20 | 0.57 |
| ▸ | CNR1 | P21554 | 1/20 | 0.51 |
| ▸ | NTSR1 | P30989 | 1/20 | 0.51 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.51 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.51 |
| ▸ | PGR | P06401 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Clorazepic Acid SCHEMBL391416 | 0.98 | LMNA (0.67) | LMNAMEN1ALBKMT2ACHRM1 | |
| Clorazepic Acid SCHEMBL1225017 | 0.98 | LMNA (0.67) | LMNAMEN1ALBKMT2ACHRM1 | |
| Clorazepic Acid SCHEMBL5185787 | 0.98 | LMNA (0.67) | LMNAMEN1ALBKMT2ACHRM1 | |
| Clorazepic Acid SCHEMBL314168 | 0.98 | LMNA (0.67) | LMNAMEN1ALBKMT2ACHRM1 | |
| Clorazepic Acid SCHEMBL4625002 | 0.98 | LMNA (0.67) | LMNAMEN1ALBKMT2ACHRM1 | |
| Clorazepic Acid SCHEMBL1302660 | 0.96 | LMNA (0.72) | LMNAMEN1ALBKMT2ACHRM1 | |
| Clorazepic Acid SCHEMBL27617141 | 0.96 | LMNA (0.72) | LMNAMEN1ALBKMT2ACHRM1 | |
| Clorazepic Acid SCHEMBL4287456 | 0.96 | LMNA (0.72) | LMNAMEN1ALBKMT2ACHRM1 | |
| Clorazepic Acid SCHEMBL236792 | 0.96 | LMNA (0.72) | LMNAMEN1ALBKMT2ACHRM1 | |
| Clorazepic Acid SCHEMBL21462311 | 0.95 | LMNA (0.70) | LMNAMEN1ALBKMT2ACHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3164889-B1 | A SEMICONDUCTOR JOSEPHSON JUNCTION COMPRISING A SEMICONDUCTOR NANOWIRE AND SUPERCONDUCTOR LAYERS THEREON | UNIV COPENHAGEN (DK) | 2023-06-07 | — | — | EP | disclosed |
| US-20230064697-A1 | SEMICONDUCTING MATERIALS WITH SURROUNDING RADIAL P-N DIODES | UNIVERSITY OF LOUISVILLE RESEARCH FOUNDATION, INC. | 2023-03-02 | — | — | US | disclosed |
| CN-113889564-A | Preparation method of composite material heterojunction | 北京量子信息科学研究院 | 2022-01-04 | — | — | CN | disclosed |
| CN-113838964-A | Superconducting-semiconductor nanowire heterojunction, method of manufacturing the same, and device comprising the same | 北京量子信息科学研究院 | 2021-12-24 | — | — | CN | disclosed |
| US-10969679-B2 | System and method for producing an optical mask for surface microtexturing, and surface microtexturing plant and method | H.E.F. (FR) | 2021-04-06 | — | — | US | disclosed |
| US-10969678-B2 | System and method for producing an optical mask for surface treatment, and surface treatment plant and method | H.E.F. (FR) | 2021-04-06 | — | — | US | disclosed |
| US-10903411-B2 | Semiconductor Josephson junction and a transmon qubit related thereto | UNIVERSITY OF COPENHAGEN | 2021-01-26 | — | — | US | disclosed |
| US-20200335638-A1 | SEMICONDUCTING MATERIALS WITH SURROUNDING RADIAL P-N DIODES | UNIVERSITY OF LOUISVILLE RESEARCH FOUNDATION, INC. | 2020-10-22 | — | — | US | disclosed |
| CN-106575667-B | Semiconductor josephson junctions and related transmon qubits | 哥本哈根大学 | 2020-07-31 | — | — | CN | disclosed |
| CN-107104186-B | Organic electronic devices, compositions, and methods | 索尔维美国有限公司 | 2020-06-30 | — | — | CN | disclosed |
| US-20070057624-A1 | Patterns of electrically conducting polymers and their application as electrodes or electrical contacts | GLOBALFOUNDRIES INC. (KY) | 2007-03-15 | — | — | US | disclosed |
| US-20060238690-A1 | Patterns of electrically conducting polymers and their application as electrodes or electrical contacts | GLOBALFOUNDRIES INC. (KY) | 2006-10-26 | — | — | US | disclosed |
| US-20060238116-A1 | Patterns of electrically conducting polymers and their application as electrodes or electrical contacts | GLOBALFOUNDRIES INC. (KY) | 2006-10-26 | — | — | US | disclosed |
| US-7095474-B2 | Patterns of electrically conducting polymers and their application as electrodes or electrical contacts | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-08-22 | — | — | US | disclosed |
| WO-2003023082-A2 | SYSTEM AND PROCESS FOR AUTOMATED MICROCONTACT PRINTING | SURFACE LOGIX, INC. (US) | 2003-03-20 | — | — | WO | disclosed |
| US-20030047535-A1 | System and process for automated microcontact printing | SURFACE LOGIX, LLC | 2003-03-13 | — | — | US | disclosed |
| US-20020025391-A1 | Electrically conductive material is selected from the group of one or more of substituted and unsubstituted polyparaphenylene vinylenes, polyphenylenes, polyanilines, polythiophenes, polyphenylene sulfide, polyacetylenes, blends or copolymer | GLOBALFOUNDRIES U.S. INC. | 2002-02-28 | — | — | US | disclosed |
| US-6331356-B1 | POLYPARAPHENYLENE VINYLENES, POLYPARAPHENYLENES, POLYANILINES, POLYTHIOPHENES, POLYAZINES, POLYFURANES, POLYPYRROLES, POLYSELENOPHENES, POLY-P-PHENYLENE SULFIDES, POLYACETYLENES, AND BLENDS | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-12-18 | — | — | US | disclosed |
| EP-0953213-A2 | PATTERNS OF ELECTRICALLY CONDUCTING POLYMERS AND THEIR APPLICATION AS ELECTRODES OR ELECTRICAL CONTACTS | International Business Machines Corporation (US) | 1999-11-03 | — | — | EP | disclosed |
| WO-1998021755-A2 | PATTERNS OF ELECTRICALLY CONDUCTING POLYMERS AND THEIR APPLICATION AS ELECTRODES OR ELECTRICAL CONTACTS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1998-05-22 | — | — | WO | disclosed |