Clorazepic Acid

Clorazepic Acid

SCHEMBL4625002

O=C(O)C1N=C(c2ccccc2)c2cc(Cl)ccc2NC1=O.[Au].[K+].[KH].[OH-]

nearest known ligand 0.67

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ

The experimentally established mechanism targets of Clorazepic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.67
MEN1 O00255 1/20 0.67
ALB P02768 1/20 0.67
KMT2A Q03164 1/20 0.67
CHRM1 P11229 6/20 0.60
CCKBR P32239 4/20 0.57
CNR1 P21554 1/20 0.51
NTSR1 P30989 1/20 0.51
OPRK1 P41145 1/20 0.51
PDE4D Q08499 1/20 0.51
PGR P06401 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Clorazepic Acid SCHEMBL391416 0.98 LMNA (0.67) LMNAMEN1ALBKMT2ACHRM1
Clorazepic Acid SCHEMBL1225017 0.98 LMNA (0.67) LMNAMEN1ALBKMT2ACHRM1
Clorazepic Acid SCHEMBL5185787 0.98 LMNA (0.67) LMNAMEN1ALBKMT2ACHRM1
Clorazepic Acid SCHEMBL314168 0.98 LMNA (0.67) LMNAMEN1ALBKMT2ACHRM1
Clorazepic Acid SCHEMBL1576595 0.98 LMNA (0.67) LMNAMEN1ALBKMT2ACHRM1
Clorazepic Acid SCHEMBL1302660 0.96 LMNA (0.72) LMNAMEN1ALBKMT2ACHRM1
Clorazepic Acid SCHEMBL27617141 0.96 LMNA (0.72) LMNAMEN1ALBKMT2ACHRM1
Clorazepic Acid SCHEMBL4287456 0.96 LMNA (0.72) LMNAMEN1ALBKMT2ACHRM1
Clorazepic Acid SCHEMBL236792 0.96 LMNA (0.72) LMNAMEN1ALBKMT2ACHRM1
Clorazepic Acid SCHEMBL21462311 0.95 LMNA (0.70) LMNAMEN1ALBKMT2ACHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103885300-A Hydrophobic surface photoetching process NANJING JING AO MICRO OPTOELECTRONIC TECHNOLOGY CO LTD 2014-06-25 CN claimed
US-11074520-B2 Extended coherence and single-shot readout of a silicon-vacancy spin in diamond PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2021-07-27 US disclosed
US-10969379-B2 Nanoporous bioelectrochemical sensors for measuring redox potential in biological samples THE REGENTS OF THE UNIVERSITY OF MICHIGAN (US) 2021-04-06 US disclosed
US-20200184362-A1 EXTENDED COHERENCE AND SINGLE-SHOT READOUT OF A SILICON-VACANCY SPIN IN DIAMOND NATIONAL SCIENCE FOUNDATION 2020-06-11 US disclosed
US-10451606-B2 Nanoporous bioelectrochemical sensors for measuring redox potential in biological samples THE REGENTS OF THE UNIVERSITY OF MICHIGAN (US) 2019-10-22 US disclosed
WO-2019033009-A1 EXTENDED COHERENCE AND SINGLE-SHOT READOUT OF A SILICON-VACANCY SPIN IN DIAMOND PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2019-02-14 WO disclosed
US-9728563-B2 Combinatorial masking APPLIED MATERIALS, INC. (US) 2017-08-08 US disclosed
US-20160266090-A1 Nanoporous Bioelectrochemical Sensors for Measuring Redox Potential in Biological Samples THE REGENTS OF THE UNIVERSITY OF MICHIGAN (US) 2016-09-15 US disclosed
US-20150279874-A1 COMBINATORIAL MASKING APPLIED MATERIALS, INC. (US) 2015-10-01 US disclosed
WO-2015061250-A2 NANOPOROUS BIOELECTROCHEMICAL SENSORS FOR MEASURING REDOX POTENTIAL IN BIOLOGICAL SAMPLES DANIELS RODNEY C (US) 2015-04-30 WO disclosed
EP-1193524-A2 Micro-electro-mechanical mirror structure Xerox Corporation (US) 2002-04-03 EP disclosed
EP-1193529-A2 Mirror structure Xerox Corporation (US) 2002-04-03 EP disclosed
EP-1193526-A1 Mirror structure Xerox Corporation (US) 2002-04-03 EP disclosed
EP-1193522-A2 Micro-electro-mechanical mirror structure manufacture Xerox Corporation (US) 2002-04-03 EP disclosed
EP-1193523-A2 Micro-electro-mechanical mirror structure Xerox Corporation (US) 2002-04-03 EP disclosed
EP-1193530-A2 Method of manufacturing a mirror structure Xerox Corporation (US) 2002-04-03 EP disclosed
EP-1193528-A2 Method of manufacturing a mirror structure Xerox Corporation (US) 2002-04-03 EP disclosed
US-6300665-B1 Structure for an optical switch on a silicon on insulator substrate XEROX CORPORATION 2001-10-09 US disclosed
EP-0188756-A2 Method for polishing detector material HONEYWELL INC. (US) 1986-07-30 EP disclosed
US-4600469-A Method for polishing detector material HONEYWELL INC. (US) 1986-07-15 US disclosed