SCHEMBL15869194

SCHEMBL15869194

C=C(C)COc1ccc(C2(c3ccc(OCC(=C)C)cc3)CCC(C(C)(C)C3CCC(c4ccc(OCC(=C)C)cc4)(c4ccc(OCC(=C)C)cc4)CC3)CC2)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GPR174 Q9BXC1 1/20 0.37
▸ PSMB1 P20618 1/20 0.35
▸ PSMB5 P28074 1/20 0.35
▸ PSMB2 P49721 1/20 0.35
▸ ADORA3 P0DMS8 1/20 0.35
▸ CHRNB2 P17787 1/20 0.32
▸ CHRNB4 P30926 1/20 0.32
▸ CHRNA3 P32297 1/20 0.32
▸ CHRNA4 P43681 1/20 0.32
▸ KMT2A Q03164 4/20 0.32
▸ MEN1 O00255 3/20 0.32
▸ TSHR P16473 1/20 0.32
▸ RAB9A P51151 1/20 0.32
▸ ACACB O00763 3/20 0.32
▸ ALDH1A1 P00352 2/20 0.32
▸ POLB P06746 1/20 0.32
▸ PKM P14618 1/20 0.32
▸ L3MBTL1 Q9Y468 1/20 0.32
▸ SMN1; SMN2 Q16637 2/20 0.31
▸ ALOX5AP P20292 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15869193 0.80 MAPT (0.39) PSMB1PSMB5PSMB2ADORA3KMT2A
SCHEMBL20804259 0.76 POLB (0.40) KMT2AMEN1ALDH1A1POLBSMN1; SMN2
SCHEMBL15934080 0.76 ALDH1A1 (0.55) PSMB1PSMB5PSMB2KMT2AMEN1
SCHEMBL15869205 0.75 SLC6A4 (0.44) PSMB1PSMB5PSMB2ADORA3ACACB
SCHEMBL15869180 0.73 ADORA3 (0.46) PSMB1PSMB5PSMB2ADORA3
SCHEMBL2620558 0.73 SLC6A4 (0.37) ADORA3KMT2AMEN1RAB9AALDH1A1
SCHEMBL16691930 0.73 ALDH1A1 (0.51) KMT2AMEN1TSHRACACBALDH1A1
SCHEMBL45831 0.73 ESR2 (0.53) TSHR
SCHEMBL15750165 0.72 ALDH1A1 (0.50) PSMB1PSMB5PSMB2ADORA3KMT2A
SCHEMBL17319675 0.72 ALDH1A1 (0.47) PSMB1PSMB5PSMB2ADORA3KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
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