SCHEMBL1593675

SCHEMBL1593675

O=S(=O)(O)C(F)(F)C(F)(F)C(F)(F)F.SC(c1ccccc1)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.40
SRC P12931 1/20 0.37
KMT2A Q03164 2/20 0.36
KDM4E B2RXH2 1/20 0.36
GMNN O75496 1/20 0.36
LMNA P02545 1/20 0.36
POLB P06746 1/20 0.36
MAPT P10636 1/20 0.36
HPGD P15428 1/20 0.36
PMP22 Q01453 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
PTPN1 P18031 1/20 0.34
HSD11B1 P28845 1/20 0.34
ACP1 P24666 1/20 0.34
PTPN7 P35236 1/20 0.34
PTPN12 Q05209 1/20 0.34
PTPN13 Q12923 1/20 0.34
SSU72 Q9NP77 1/20 0.34
CA1 P00915 3/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1593154 0.95 ALDH1A1 (0.39) ALDH1A1SRCKMT2AKDM4EGMNN
Trifluoromethanesulfonic Acid SCHEMBL1593380 0.84 SRC (0.42) ALDH1A1SRCKMT2AKDM4EGMNN
Benzenethiol SCHEMBL29745974 0.76 CA2 (0.39) PTPN1CA1CA2MMP1MMP2
Biphenyl SCHEMBL1816739 0.74 PTPN1 (0.47) PTPN1CA1CA2MMP1MMP2
SCHEMBL39694 0.73 CA2 (0.44) ALDH1A1TDP1CA1CA2MMP1
SCHEMBL13836717 0.72 TSHR (0.57) LMNAPOLBHSD11B1CA1CA2
Iodobenzene SCHEMBL5315922 0.72 CA2 (0.39) PTPN1CA1CA2MMP1MMP2
Hydroquinone SCHEMBL575758 0.72 LMNA (0.43) ALDH1A1SRCKMT2AKDM4EGMNN
Diphenylsulfane SCHEMBL29961389 0.71 CA2 (0.38) ALDH1A1HPGDPTPN1CA1CA2
SCHEMBL1362601 0.71 CA2 (0.38) PTPN1CA1CA2MMP1MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110091818-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-21 US disclosed
US-20100273113-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-10-28 US disclosed
US-20100273112-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-10-28 US disclosed