Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 17/20 | 0.38 |
| ▸ | CA1 | P00915 | 16/20 | 0.38 |
| ▸ | MMP1 | P03956 | 6/20 | 0.38 |
| ▸ | MMP2 | P08253 | 6/20 | 0.38 |
| ▸ | MMP9 | P14780 | 6/20 | 0.38 |
| ▸ | MMP8 | P22894 | 6/20 | 0.38 |
| ▸ | MMP13 | P45452 | 6/20 | 0.38 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.35 |
| ▸ | F2 | P00734 | 1/20 | 0.33 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.33 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.33 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL51422 | 0.83 | CA2 (0.38) | CA2CA1MMP1MMP2MMP9 | |
| Biphenyl SCHEMBL1816739 | 0.82 | PTPN1 (0.47) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL59303 | 0.81 | CA2 (0.40) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL213386 | 0.81 | CA2 (0.40) | CA2CA1MMP1MMP2MMP9 | |
| Trifluoromethanesulfonic Acid SCHEMBL758916 | 0.81 | PTPN1 (0.41) | CA2CA1PTPN1 | |
| Perflubutane SCHEMBL2313825 | 0.81 | ALDH1A1 (0.38) | CA2CA1PTPN1 | |
| Benzenethiol SCHEMBL29745974 | 0.81 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| Iodobenzene SCHEMBL5315922 | 0.81 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL13836717 | 0.81 | TSHR (0.57) | CA2CA1MMP1MMP2MMP9 | |
| Trifluoromethanesulfonic Acid SCHEMBL12613417 | 0.80 | GPR3 (0.40) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8067148-B2 | Pattern forming method | PANASONIC CORPORATION (JP) | 2011-11-29 | — | — | US | claimed |
| US-7943285-B2 | Forming intermediate layer pattern by etching intermediate film with first resist pattern used as a mask; high resolution attained by double patterning; treatment with acetic, formic, methansulfonic, or butanesulfonic acid; immersion lithography; crosslinking, annealing | PANASONIC CORPORATION (JP) | 2011-05-17 | — | — | US | claimed |
| US-20100221672-A1 | PATTERN FORMING METHOD | PANASONIC CORPORATION (JP) | 2010-09-02 | — | — | US | claimed |
| US-20080227038-A1 | PATTERN FORMATION METHOD | PANASONIC CORPORATION (JP) | 2008-09-18 | — | — | US | claimed |
| US-8067148-B2 | Pattern forming method | PANASONIC CORPORATION (JP) | 2011-11-29 | — | — | US | disclosed |
| US-7943285-B2 | Forming intermediate layer pattern by etching intermediate film with first resist pattern used as a mask; high resolution attained by double patterning; treatment with acetic, formic, methansulfonic, or butanesulfonic acid; immersion lithography; crosslinking, annealing | PANASONIC CORPORATION (JP) | 2011-05-17 | — | — | US | disclosed |
| US-20100221672-A1 | PATTERN FORMING METHOD | PANASONIC CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20080227038-A1 | PATTERN FORMATION METHOD | PANASONIC CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |